Inventor

PARKER N WILLIAM

US49 patents

⚠️ This page may combine multiple inventors who share the name “PARKER N WILLIAM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PARKER N WILLIAM

FEI CO

High aspect ratio x-ray targets and uses of same

System and method for simultaneous detection of secondary electrons and light in a charged particle beam system

High aspect ratio X-ray targets and uses of same

Multi species ion source

Multi species ion source

Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source

System and method for simultaneous detection of secondary electrons and light in a charged particle beam system

Integrated light optics and gas delivery in a charged particle lens

Charged-particle lens that transmits emissions from sample

Image-enhancing spotlight mode for digital microscopy

Electron microscope with multiple types of integrated x-ray detectors arranged in an array

Charged particle beam system aperture

Chicane blanker assemblies for charged particle beam systems and methods of using the same

MULTIBEAM SYSTEMS INC

Multi-beam multi-column electron beam inspection system

Electron optics for multi-beam electron beam lithography tool

Multi-beam multi-column electron beam inspection system

Optics for generation of high current density patterned charged particle beams

Apparatus and method for inspection and testing of flat panel display substrates

Dual detector optics for simultaneous collection of secondary and backscattered electrons

Detector optics for charged particle beam inspection system

Platform positioning system

Multi-beam multi-column electron beam inspection system

Multi-column charged particle optics assembly

Image processing system for multi-beam inspection

Detector optics for multiple electron beam test system

PARKER N WILLIAM

System and method for localization of large numbers of fluorescent markers in biological samples

Charged particle optics with azimuthally-varying third-order aberrations for generation of shaped beams

Charged particle energy filter

Charged particle source with multiple selectable particle emitters

KELLOGG SEAN

Encapsulation of electrodes in solid media for use in conjunction with fluid high voltage isolation

High voltage isolation of an inductively coupled plasma ion source with a liquid that is not actively pumped

Encapsulation of electrodes in solid media

System for attachment of an electrode into a plasma source

PLASMA & MATERIALS TECH

High density plasma deposition and etching apparatus

High density plasma deposition and etching apparatus

MULTIBEAM CORP

Variable-ratio double-deflection beam blanker

Flat panel display substrate testing system

GRAUPERA ANTHONY

Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source

On-axis detector for charged particle beam system

TUGGLE DAVID

Aberration-corrected wien ExB mass filter with removal of neutrals from the Beam

Wide aperature wien ExB mass filter

STRAW MARCUS

Combination laser and charged particle beam system

MULTIBEAM

Detector optics for electron beam inspection system

ROYS CURTIS

Method and structure for prevention of incorrect fueling operations for diesel-powered vehicles

TOKYO ELECTRON LTD

Optics for generation of high current density patterned charged particle beams

CHIDAMBARAM MAHENDRAN

Wafer processing system with dual wafer robots capable of asynchronous motion

(unassigned)

Proximity effect correction method through uniform removal of fraction of interior pixels

ION DIAGNOSTICS INC

Electron source for multibeam electron lithography system

WELLS ANDREW B

Lamella creation method and device using fixed-angle beam and rotating sample stage