Inventor

SETIJA IRWAN DANI

NL18 patents

⚠️ This page may combine multiple inventors who share the name “SETIJA IRWAN DANI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SETIJA IRWAN DANI

ASML NETHERLANDS BV

Method and apparatus for angular-resolved spectroscopic lithography characterization

Methods and apparatus for calculating electromagnetic scattering properties of a structure and for estimation of geometrical and material parameters thereof

Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby

Lithographic apparatus, alignment system, and device manufacturing method

Lithographic apparatus with alignment subsystem, device manufacturing method, using alignment, and alignment structure

Alignment measurement system

Method and apparatus for measuring a structure on a substrate

Metrology systems, coherence scrambler illumination sources and methods thereof

Alignment measurement system

Method and apparatus for measuring a structure on a substrate, models for error correction, computer program products for implementing such methods and apparatus

Method and apparatus for calculating electromagnetic scattering properties of finite periodic structures

PISARENCO MAXIM

Reference library generation method for methods of inspection, inspection apparatus and lithographic apparatus

Method and apparatus for calculating electromagnetic scattering properties of finite periodic structures

DEN BOEF ARIE JEFFREY

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

DIRKS REMCO

Methods and apparatus for determining electromagnetic scattering properties and structural parameters of periodic structures

VAN BEURDEN MARTIJN CONSTANT

Methods and apparatus for calculating electromagnetic scattering properties of a structure using a normal-vector field and for reconstruction of approximate structures

SETIJA IRWAN DANI

Method and apparatus for angular-resolved spectroscopic lithography characterization

COENE WILLEM MARIE JULIA MARCEL

Scatterometry method and measurement system for lithography