Inventor
VELLAIKAL MANOJ
US19 patents
⚠️ This page may combine multiple inventors who share the name “VELLAIKAL MANOJ”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
16 patentsUS7628897B2Dec 8, 2009
Reactive ion etching for semiconductor device feature topography modification
APPLIED MATERIALS INC230 citations98
US7205240B2Apr 17, 2007
HDP-CVD multistep gapfill process
APPLIED MATERIALS INC114 citations95
US6413871B2Jul 2, 2002
Nitrogen treatment of polished halogen-doped silicon glass
APPLIED MATERIALS INC40 citations92
US6410457B1Jun 25, 2002
Method for improving barrier layer adhesion to HDP-FSG thin films
APPLIED MATERIALS INC17 citations92
US9870921B2Jan 16, 2018
Cleaning method
APPLIED MATERIALS INC6 citations83
US7867921B2Jan 11, 2011
Reduction of etch-rate drift in HDP processes
APPLIED MATERIALS INC7 citations83
US7745350B2Jun 29, 2010
Impurity control in HDP-CVD DEP/ETCH/DEP processes
APPLIED MATERIALS INC13 citations83
US7229931B2Jun 12, 2007
Oxygen plasma treatment for enhanced HDP-CVD gapfill
APPLIED MATERIALS INC16 citations81
US6803325B2Oct 12, 2004
Apparatus for improving barrier layer adhesion to HDP-FSG thin films
APPLIED MATERIALS INC12 citations73
US11087979B2Aug 10, 2021
Cleaning method
APPLIED MATERIALS INC1 citations72
US10199221B2Feb 5, 2019
Cleaning method
APPLIED MATERIALS INC2 citations72
US7329586B2Feb 12, 2008
Gapfill using deposition-etch sequence
APPLIED MATERIALS INC6 citations62
US7659184B2Feb 9, 2010
Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking
APPLIED MATERIALS INC3 citations61
US8927400B2Jan 6, 2015
Safe handling of low energy, high dose arsenic, phosphorus, and boron implanted wafers
APPLIED MATERIALS INC1 citations51
US8003500B2Aug 23, 2011
Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking
APPLIED MATERIALS INC1 citations51
US12356705B2Jul 8, 2025
Electrical contact cavity structure and methods of forming the same
APPLIED MATERIALS INC0 citations47