Inventor

CHEN JANG F

US4 patents

Patents

4 patents

US5447810ASep 5, 1995

Masks for improved lithographic patterning for off-axis illumination lithography

MICROUNITY SYSTEMS ENG190 citations98

US5242770ASep 7, 1993

Mask for photolithography

MICROUNITY SYSTEMS ENG482 citations98

US5340700AAug 23, 1994

Method for improved lithographic patterning in a semiconductor fabrication process

MICROUNITY SYSTEMS ENG120 citations97

US5256505AOct 26, 1993

Lithographical mask for controlling the dimensions of resist patterns

MICROUNITY SYSTEMS ENG108 citations95