Inventor
KAJITA TATSUYA
JP20 patents
⚠️ This page may combine multiple inventors who share the name “KAJITA TATSUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJITSU LTD
11 patentsUS5910916AJun 8, 1999
Flash-erasable semiconductor memory device having improved reliability
FUJITSU LTD21 citations92
US5497018AMar 5, 1996
Semiconductor memory device having a floating gate with improved insulation film quality
FUJITSU LTD21 citations92
US5449629ASep 12, 1995
Method for fabricating a semiconductor memory device having a floating gate with improved insulation film quality
FUJITSU LTD27 citations92
US5761127AJun 2, 1998
Flash-erasable semiconductor memory device having an improved reliability
FUJITSU LTD14 citations82
US5950086ASep 7, 1999
Method of fabricating an EPROM type device with reduced process residues
FUJITSU LTD13 citations74
US5835408ANov 10, 1998
Flash-erasable semiconductor memory device having an improved reliability
FUJITSU LTD8 citations74
US5468664ANov 21, 1995
Method of making semiconductor device with alignment marks
FUJITSU LTD9 citations73
US5870337AFeb 9, 1999
Flash-erasable semiconductor memory device having an improved reliability
FUJITSU LTD2 citations63
US5835416ANov 10, 1998
Flash-erasable semiconductor memory device having an improved reliability
FUJITSU LTD1 citations63
US5641979AJun 24, 1997
Semiconductor memory device having electrically erasable programmable read only memory and dynamic random access memory functions and method of writing, reading and erasing information therefor
FUJITSU LTD4 citations63
US5391902AFeb 21, 1995
Semiconductor device and production method thereof
FUJITSU LTD1 citations52
ADVANCED MICRO DEVICES INC
6 patentsUS5907781AMay 25, 1999
Process for fabricating an integrated circuit with a self-aligned contact
ADVANCED MICRO DEVICES INC59 citations96
US6232646B1May 15, 2001
Shallow trench isolation filled with thermal oxide
ADVANCED MICRO DEVICES INC19 citations84
US6444539B1Sep 3, 2002
Method for producing a shallow trench isolation filled with thermal oxide
ADVANCED MICRO DEVICES INC10 citations74
US6444530B1Sep 3, 2002
Process for fabricating an integrated circuit with a self-aligned contact
ADVANCED MICRO DEVICES INC2 citations63
US6249036B1Jun 19, 2001
Stepper alignment mark formation with dual field oxide process
ADVANCED MICRO DEVICES INC4 citations63
US6420224B2Jul 16, 2002
Stepper alignment mark formation with dual field oxide process
ADVANCED MICRO DEVICES INC1 citations52