Inventor
OHIWA TOKUHISA
JP33 patents
⚠️ This page may combine multiple inventors who share the name “OHIWA TOKUHISA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
25 patentsUS6433297B1Aug 13, 2002
Plasma processing method and plasma processing apparatus
TOSHIBA KK90 citations98
US5756402AMay 26, 1998
Method of etching silicon nitride film
TOSHIBA KK250 citations97
US5998100ADec 7, 1999
Fabrication process using a multi-layer antireflective layer
TOSHIBA KK89 citations96
US5759746AJun 2, 1998
Fabrication process using a thin resist
TOSHIBA KK75 citations96
US5310454AMay 10, 1994
Dry etching method
TOSHIBA KK54 citations96
US5094879AMar 10, 1992
Method of activating at least one gas to produce different charged species, selecting specific species, decelerating the species, and chemically reacting the species to form a thin film
TOSHIBA KK24 citations93
US6576562B2Jun 10, 2003
Manufacturing method of semiconductor device using mask pattern having high etching resistance
TOSHIBA KK36 citations92
US5874363AFeb 23, 1999
Polycide etching with HCL and chlorine
TOSHIBA KK35 citations88
US7022616B2Apr 4, 2006
High speed silicon etching method
TOSHIBA KK15 citations84
US6780278B2Aug 24, 2004
Plasma processing apparatus with reduced parasitic capacity and loss in RF power
TOSHIBA KK16 citations84
US6911398B2Jun 28, 2005
Method of sequentially processing a plurality of lots each including semiconductor substrates
TOSHIBA KK10 citations74
US6689699B2Feb 10, 2004
Method for manufacturing a semiconductor device using recirculation of a process gas
TOSHIBA KK8 citations74
US6274512B1Aug 14, 2001
Method for manufacturing a semiconductor device
TOSHIBA KK11 citations74
US5658389AAug 19, 1997
Thin film forming method and apparatus
TOSHIBA KK9 citations74
US6846750B1Jan 25, 2005
High precision pattern forming method of manufacturing a semiconductor device
TOSHIBA KK9 citations73
US6420271B2Jul 16, 2002
Method of forming a pattern
TOSHIBA KK8 citations73
US6369423B2Apr 9, 2002
Semiconductor device with a thin gate stack having a plurality of insulating layers
TOSHIBA KK9 citations73
US6887802B2May 3, 2005
Method of manufacturing semiconductor device and semiconductor device
TOSHIBA KK3 citations63
US7327455B2Feb 5, 2008
Process monitoring system, process monitoring method, and method for manufacturing semiconductor device
TOSHIBA KK2 citations60
US7285498B2Oct 23, 2007
Etching method
TOSHIBA KK2 citations60
US7045462B2May 16, 2006
Method for fabricating a pattern and method for manufacturing a semiconductor device
TOSHIBA KK5 citations60
US7767582B2Aug 3, 2010
Method of manufacturing semiconductor device
TOSHIBA KK1 citations51
US7595885B2Sep 29, 2009
Process monitoring system, process monitoring method, and method for manufacturing semiconductor device
TOSHIBA KK0 citations50
US7349088B2Mar 25, 2008
Process monitoring system, process monitoring method, and method for manufacturing semiconductor device
TOSHIBA KK0 citations50
US7182879B2Feb 27, 2007
Plasma processing method
TOSHIBA KK0 citations42