Inventor
HENNIG MARIO
DE7 patents
⚠️ This page may combine multiple inventors who share the name “HENNIG MARIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INFINEON TECHNOLOGIES AG
6 patentsUS7339652B2Mar 4, 2008
Apparatus for projecting a pattern into an image plane
INFINEON TECHNOLOGIES AG9 citations80
US7425396B2Sep 16, 2008
Method for reducing an overlay error and measurement mark for carrying out the same
INFINEON TECHNOLOGIES AG19 citations79
US7393613B2Jul 1, 2008
Set of at least two masks for the projection of structure patterns
INFINEON TECHNOLOGIES AG7 citations70
US6838216B2Jan 4, 2005
Photolithographic mask and methods for producing a structure and of exposing a wafer in a projection apparatus
INFINEON TECHNOLOGIES AG9 citations70
US7393614B2Jul 1, 2008
Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer
INFINEON TECHNOLOGIES AG3 citations60
US7045254B2May 16, 2006
Mask with programmed defects and method for the fabrication thereof
INFINEON TECHNOLOGIES AG6 citations53