Inventor
KANG HOYOUNG
US23 patents
⚠️ This page may combine multiple inventors who share the name “KANG HOYOUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
19 patentsUS10068764B2Sep 4, 2018
Selective metal oxide deposition using a self-assembled monolayer surface pretreatment
TOKYO ELECTRON LTD7 citations84
US9385129B2Jul 5, 2016
Method of forming a memory capacitor structure using a self-assembly pattern
TOKYO ELECTRON LTD12 citations83
US10115726B2Oct 30, 2018
Method and system for forming memory fin patterns
TOKYO ELECTRON LTD4 citations72
US11791167B2Oct 17, 2023
Cyclic self-limiting etch process
TOKYO ELECTRON LTD2 citations71
US11460775B2Oct 4, 2022
Method and system for prevention of metal contamination by using a self-assembled monolayer coating
TOKYO ELECTRON LTD2 citations71
US12341053B2Jun 24, 2025
System for backside deposition of a substrate
TOKYO ELECTRON LTD0 citations62
US11908728B2Feb 20, 2024
System for backside deposition of a substrate
TOKYO ELECTRON LTD0 citations62
US11484993B2Nov 1, 2022
Substrate holding apparatus and method for shape metrology
TOKYO ELECTRON LTD0 citations62
US11247309B2Feb 15, 2022
Substrate holding apparatus and method for shape metrology
TOKYO ELECTRON LTD0 citations62
US11314166B2Apr 26, 2022
Fast imprint lithography
TOKYO ELECTRON LTD0 citations61
US10890843B2Jan 12, 2021
Fast imprint lithography
TOKYO ELECTRON LTD0 citations61
US11043378B2Jun 22, 2021
Systems and methods for inhibiting detectivity, metal particle contamination, and film growth on wafers
TOKYO ELECTRON LTD0 citations60
US12354991B2Jul 8, 2025
Replacement buried power rail in backside power delivery
TOKYO ELECTRON LTD0 citations52
US11567407B2Jan 31, 2023
Method for globally adjusting spacer critical dimension using photo-active self-assembled monolayer
TOKYO ELECTRON LTD0 citations52
US10784100B2Sep 22, 2020
Back-side friction reduction of a substrate
TOKYO ELECTRON LTD0 citations51
US9508557B2Nov 29, 2016
Method of improving line roughness in substrate processing
TOKYO ELECTRON LTD1 citations51
US10525416B2Jan 7, 2020
Method of liquid filter wetting
TOKYO ELECTRON LTD0 citations50
US10707070B2Jul 7, 2020
Methods and systems for coating a substrate with a fluid
TOKYO ELECTRON LTD0 citations40
US10504715B2Dec 10, 2019
Back-side friction reduction of a substrate
TOKYO ELECTRON LTD0 citations40