Inventor
HARUTYUNYAN DAVIT
US7 patents
Patents
7 patentsUS10162271B2Dec 25, 2018
Metrology method and apparatus, substrate, lithographic system and device manufacturing method
ASML NETHERLANDS BV7 citations82
US11803127B2Oct 31, 2023
Method for determining root cause affecting yield in a semiconductor manufacturing process
ASML NETHERLANDS BV3 citations71
US10739687B2Aug 11, 2020
Metrology method and apparatus, substrate, lithographic system and device manufacturing method
ASML NETHERLANDS BV4 citations71
US10816904B2Oct 27, 2020
Method for determining contribution to a fingerprint
ASML NETHERLANDS BV2 citations70
US11526085B2Dec 13, 2022
Metrology method and apparatus, substrate, lithographic system and device manufacturing method
ASML NETHERLANDS BV0 citations61
US11378891B2Jul 5, 2022
Method for determining contribution to a fingerprint
ASML NETHERLANDS BV1 citations59
US11754931B2Sep 12, 2023
Method for determining corrections for lithographic apparatus
ASML NETHERLANDS BV0 citations58