Inventor
SATO KENICHIRO
JP109 patents
⚠️ This page may combine multiple inventors who share the name “SATO KENICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJI PHOTO FILM CO LTD
37 patentsUS6479211B1Nov 12, 2002
Positive photoresist composition for far ultraviolet exposure
FUJI PHOTO FILM CO LTD149 citations99
US5945250AAug 31, 1999
Positive photosensitive composition
FUJI PHOTO FILM CO LTD127 citations98
US5529881AJun 25, 1996
Postive photoresist composition
FUJI PHOTO FILM CO LTD108 citations98
US6291130B1Sep 18, 2001
Positive photosensitive composition
FUJI PHOTO FILM CO LTD60 citations96
US6042991AMar 28, 2000
Positive working photosensitive composition
FUJI PHOTO FILM CO LTD49 citations96
US6927009B2Aug 9, 2005
Positive photosensitive composition
FUJI PHOTO FILM CO LTD36 citations93
US6858370B2Feb 22, 2005
Positive photosensitive composition
FUJI PHOTO FILM CO LTD29 citations93
US6824956B2Nov 30, 2004
Positive resist composition
FUJI PHOTO FILM CO LTD32 citations93
US6806022B1Oct 19, 2004
Positive photosensitive resin composition
FUJI PHOTO FILM CO LTD24 citations93
US6787283B1Sep 7, 2004
Positive photoresist composition for far ultraviolet exposure
FUJI PHOTO FILM CO LTD30 citations93
US6787282B2Sep 7, 2004
Positive resist composition
FUJI PHOTO FILM CO LTD23 citations93
US6692884B2Feb 17, 2004
Positive photoresist composition
FUJI PHOTO FILM CO LTD28 citations93
US6596458B1Jul 22, 2003
Positive-working photoresist composition
FUJI PHOTO FILM CO LTD58 citations93
US6517991B1Feb 11, 2003
Positive photosensitive composition
FUJI PHOTO FILM CO LTD36 citations93
US6506535B1Jan 14, 2003
Positive working photoresist composition
FUJI PHOTO FILM CO LTD33 citations93
US6242153B1Jun 5, 2001
Positive photoresist composition for far ultraviolet ray exposure
FUJI PHOTO FILM CO LTD40 citations93
US6238842B1May 29, 2001
Positive photosensitive composition
FUJI PHOTO FILM CO LTD27 citations93
US6159656ADec 12, 2000
Positive photosensitive resin
FUJI PHOTO FILM CO LTD33 citations93
US6159655ADec 12, 2000
Positive photoresist composition for exposure to far ultraviolet light
FUJI PHOTO FILM CO LTD24 citations93
US5981140ANov 9, 1999
Positive photosensitive composition
FUJI PHOTO FILM CO LTD31 citations93
US5700620ADec 23, 1997
Radiation ray sensitive resin compostion containing at least two different naphthoquinonediazide sulfonic acid esters and an alkali-soluble low-molecular compound
FUJI PHOTO FILM CO LTD25 citations93
US5609982AMar 11, 1997
Positive-working photoresist composition
FUJI PHOTO FILM CO LTD22 citations93
US6245485B1Jun 12, 2001
Positive resist composition
FUJI PHOTO FILM CO LTD24 citations92
US5747218AMay 5, 1998
Positive photoresist composition
FUJI PHOTO FILM CO LTD24 citations92
US5629128AMay 13, 1997
Positive photoresist composition
FUJI PHOTO FILM CO LTD38 citations92
US6576392B1Jun 10, 2003
Positive photoresist composition
FUJI PHOTO FILM CO LTD47 citations91
US7179578B2Feb 20, 2007
Positive resist composition
FUJI PHOTO FILM CO LTD14 citations84
US6962766B2Nov 8, 2005
Positive photoresist composition
FUJI PHOTO FILM CO LTD17 citations84
US6897004B2May 24, 2005
Intermediate layer material composition for multilayer resist process and pattern formation process using the same
FUJI PHOTO FILM CO LTD18 citations84
US6808860B2Oct 26, 2004
Positive photoresist composition
FUJI PHOTO FILM CO LTD14 citations84
US6777160B2Aug 17, 2004
Positive-working resist composition
FUJI PHOTO FILM CO LTD15 citations84
US6696219B2Feb 24, 2004
Positive resist laminate
FUJI PHOTO FILM CO LTD15 citations84
US6632586B1Oct 14, 2003
Positive resist composition
FUJI PHOTO FILM CO LTD15 citations84
US6589705B1Jul 8, 2003
Positive-working photoresist composition
FUJI PHOTO FILM CO LTD19 citations84
US6544715B2Apr 8, 2003
Positive photoresist composition for far ultraviolet ray exposure
FUJI PHOTO FILM CO LTD19 citations84
US6528229B2Mar 4, 2003
Positive photoresist composition
FUJI PHOTO FILM CO LTD13 citations84
US6479209B1Nov 12, 2002
Positive photosensitive composition
FUJI PHOTO FILM CO LTD15 citations84
FUJIFILM CORP
6 patentsUS7252924B2Aug 7, 2007
Positive resist composition and method of pattern formation using the same
FUJIFILM CORP26 citations92
US7615331B2Nov 10, 2009
Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device
FUJIFILM CORP15 citations84
US7615324B2Nov 10, 2009
Photosensitive composition, and cured relief pattern production method and semiconductor device using the same
FUJIFILM CORP8 citations84
US7598009B2Oct 6, 2009
Photosensitive resin composition, production method for cured relief pattern using it, and semiconductor device
FUJIFILM CORP8 citations84
US7368216B2May 6, 2008
Photosensitive resin composition and manufacturing method of semiconductor device using the same
FUJIFILM CORP9 citations84
US7291441B2Nov 6, 2007
Positive resist composition and pattern forming method utilizing the same
FUJIFILM CORP13 citations84
TOYOTA MOTOR CO LTD
2 patentsCANON KK
1 patentSANDEN CORP
1 patentFUJI ELECTRIC CO LTD
1 patentEQUOS RES CO LTD
1 patentKEIHIN CORP
1 patentShowing the top 50 of 109 patents by PatentIndex Score.