Inventor
GAN WEE-CHEN RICHARD
US2 patents
Patents
2 patentsUS7040958B2May 9, 2006
Torque-based end point detection methods for chemical mechanical polishing tool which uses ceria-based CMP slurry to polish to protective pad layer
MOSEL VITELIC INC14 citations79
US7070484B2Jul 4, 2006
Pad break-in method for chemical mechanical polishing tool which polishes with ceria-based slurry
MOSEL VITELIC INC4 citations57