Inventor
JEONG SEONGJUN
KR13 patents
Patents
13 patentsUS10996556B2May 4, 2021
Pellicles for photomasks, reticles including the photomasks, and methods of manufacturing the pellicles
SAMSUNG ELECTRONICS CO LTD3 citations73
US10928723B2Feb 23, 2021
Pellicle for photomask, reticle including the same, and exposure apparatus for lithography
SAMSUNG ELECTRONICS CO LTD2 citations73
US10424490B2Sep 24, 2019
Hardmask composition, method of forming pattern using the hardmask composition, and hardmask formed from the hardmask composition
SAMSUNG ELECTRONICS CO LTD3 citations73
US10808142B2Oct 20, 2020
Method of preparing graphene quantum dot, hardmask composition including the graphene quantum dot obtained by the method, method of forming patterns using the hardmask composition, and hardmask formed from the hardmask composition
SAMSUNG ELECTRONICS CO LTD2 citations72
US10551735B2Feb 4, 2020
Pellicle composition for photomask, pellicle for photomask formed from the pellicle composition, method of forming the pellicle, reticle including the pellicle, and exposure apparatus for lithography including the reticle
SAMSUNG ELECTRONICS CO LTD2 citations72
US9882074B2Jan 30, 2018
Optoelectronic device
SAMSUNG ELECTRONICS CO LTD6 citations69
US11703753B2Jul 18, 2023
Pellicles for photomasks, reticles including the photomasks, and methods of manufacturing the pellicles
SAMSUNG ELECTRONICS CO LTD0 citations62
US10777412B2Sep 15, 2020
Hardmask composition, method of preparing the same, and method of forming patterned layer by using the hardmask composition
SAMSUNG ELECTRONICS CO LTD1 citations62
US11034847B2Jun 15, 2021
Hardmask composition, method of forming pattern using hardmask composition, and hardmask formed from hardmask composition
SAMSUNG ELECTRONICS CO LTD0 citations51
US10138543B2Nov 27, 2018
Method of analyzing growth of two-dimensional material
SAMSUNG ELECTRONICS CO LTD0 citations51
US9929238B2Mar 27, 2018
Graphene-containing device having graphene nanopatterns separated by narrow dead zone distance
SAMSUNG ELECTRONICS CO LTD1 citations51
US9748108B2Aug 29, 2017
Method of forming graphene nanopattern by using mask formed from block copolymer
SAMSUNG ELECTRONICS CO LTD1 citations51
US10312100B2Jun 4, 2019
Conductor including nano-patterned substrate and method of manufacturing the conductor
SAMSUNG ELECTRONICS CO LTD0 citations44