Inventor
DZIURA THADDEUS G
US11 patents
⚠️ This page may combine multiple inventors who share the name “DZIURA THADDEUS G”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR TECH CORP
5 patentsUS7317531B2Jan 8, 2008
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP83 citations98
US7382447B2Jun 3, 2008
Method for determining lithographic focus and exposure
KLA TENCOR TECH CORP46 citations95
US7933016B2Apr 26, 2011
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP15 citations92
US7663753B2Feb 16, 2010
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP19 citations92
US7656512B2Feb 2, 2010
Method for determining lithographic focus and exposure
KLA TENCOR TECH CORP15 citations84
DZIURA THADDEUS G
3 patentsUS10325004B1Jun 18, 2019
Method of optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology
DZIURA THADDEUS G11 citations82
US9310296B2Apr 12, 2016
Optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology
DZIURA THADDEUS G4 citations71
US8090558B1Jan 3, 2012
Optical parametric model optimization
DZIURA THADDEUS G4 citations60