Inventor

NGUYEN ANDREW

US199 patents

⚠️ This page may combine multiple inventors who share the name “NGUYEN ANDREW”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NGUYEN ANDREW

APPLIED MATERIALS INC

Symmetric plasma process chamber

Chemical vapor deposition plasma reactor having plural ion shower grids

Semiconductor substrate process using an optically writable carbon-containing mask

Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing

Low temperature CVD process with selected stress of the CVD layer on CMOS devices

Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer

Semiconductor substrate process using a low temperature deposited carbon-containing hard mask

Copper barrier reflow process employing high speed optical annealing

Low temperature plasma deposition process for carbon layer deposition

Chemical vapor deposition plasma process using plural ion shower grids

Chemical vapor deposition plasma process using an ion shower grid

Semiconductor junction formation process including low temperature plasma deposition of an optical absorption layer and high speed optical annealing

Substrate support

Inductively coupled parallel-plate plasma reactor with a conical dome

Method and apparatus for semiconductor processing chamber pressure control

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Semiconductor system assemblies and methods of operation

Plasma immersion ion implantation reactor having an ion shower grid

RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor

Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage

Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement

Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage

Plasma immersion ion implantation process

Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage

Externally excited torroidal plasma source with magnetic control of ion distribution

Externally excited torroidal plasma source with a gas distribution plate

Method of processing a workpiece using an externally excited torroidal plasma source

Externally excited torroidal plasma source

Fabrication of silicon-on-insulator structure using plasma immersion ion implantation

Electrostatic chuck with smart lift-pin mechanism for a plasma reactor

Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer

Externally excited multiple torroidal plasma source

Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate

Externally excited torroidal plasma source using a gas distribution plate

Substrate support having heat transfer system

Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity

Plasma immersion ion implantation process

Semiconductor on insulator vertical transistor fabrication and doping process

Plasma immersion ion implantation process

Externally excited torroidal plasma source

LIN XING

Substrate support with symmetrical feed structure

Methods and apparatus for controlling substrate temperature in a process chamber

CARDUCCI JAMES D

Lower liner with integrated flow equalizer and improved conductance

Lower liner with integrated flow equalizer and improved conductance

CRUSE JAMES P

Methods for processing substrates in process systems having shared resources

ASML HOLDINGS N V

Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surface

HANAWA HIROJI

Plasma immersion ion implantation reactor having multiple ion shower grids