Inventor
LAKSHMANAN ANNAMALAI
US26 patents
⚠️ This page may combine multiple inventors who share the name “LAKSHMANAN ANNAMALAI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
24 patentsUS7288205B2Oct 30, 2007
Hermetic low dielectric constant layer for barrier applications
APPLIED MATERIALS INC19 citations92
US7229911B2Jun 12, 2007
Adhesion improvement for low k dielectrics to conductive materials
APPLIED MATERIALS INC24 citations92
US7091137B2Aug 15, 2006
Bi-layer approach for a hermetic low dielectric constant layer for barrier applications
APPLIED MATERIALS INC43 citations90
US7259111B2Aug 21, 2007
Interface engineering to improve adhesion between low k stacks
APPLIED MATERIALS INC14 citations83
US10431493B2Oct 1, 2019
Doping control of metal nitride films
APPLIED MATERIALS INC5 citations82
US7189658B2Mar 13, 2007
Strengthening the interface between dielectric layers and barrier layers with an oxide layer of varying composition profile
APPLIED MATERIALS INC11 citations82
US6923189B2Aug 2, 2005
Cleaning of CVD chambers using remote source with cxfyoz based chemistry
APPLIED MATERIALS INC8 citations73
US12022650B2Jun 25, 2024
Low resistivity DRAM buried word line stack
APPLIED MATERIALS INC2 citations72
US11587936B2Feb 21, 2023
Low resistivity DRAM buried word line stack
APPLIED MATERIALS INC2 citations72
US10204764B2Feb 12, 2019
Methods for forming a metal silicide interconnection nanowire structure
APPLIED MATERIALS INC2 citations72
US9613859B2Apr 4, 2017
Direct deposition of nickel silicide nanowire
APPLIED MATERIALS INC5 citations72
US10008412B2Jun 26, 2018
Doping control of metal nitride films
APPLIED MATERIALS INC2 citations71
US9659814B2May 23, 2017
Doping control of metal nitride films
APPLIED MATERIALS INC2 citations71
US9466524B2Oct 11, 2016
Method of depositing metals using high frequency plasma
APPLIED MATERIALS INC2 citations63
US12453086B2Oct 21, 2025
Low resistivity metal contact stack
APPLIED MATERIALS INC0 citations62
US12281387B2Apr 22, 2025
Method of depositing metal films
APPLIED MATERIALS INC0 citations62
US10930472B2Feb 23, 2021
Methods for forming a metal silicide interconnection nanowire structure
APPLIED MATERIALS INC0 citations62
US7273823B2Sep 25, 2007
Situ oxide cap layer development
APPLIED MATERIALS INC3 citations62
US11587829B2Feb 21, 2023
Doping control of metal nitride films
APPLIED MATERIALS INC0 citations61
US10910263B2Feb 2, 2021
Doping control of metal nitride films
APPLIED MATERIALS INC0 citations61
US12104243B2Oct 1, 2024
Methods and apparatus for processing a substrate
APPLIED MATERIALS INC0 citations60
US9076661B2Jul 7, 2015
Methods for manganese nitride integration
APPLIED MATERIALS INC2 citations59
US10784157B2Sep 22, 2020
Doped tantalum nitride for copper barrier applications
APPLIED MATERIALS INC1 citations58
US10593592B2Mar 17, 2020
Laminate and core shell formation of silicide nanowire
APPLIED MATERIALS INC0 citations41