Inventor

MA PAUL F

US56 patents

⚠️ This page may combine multiple inventors who share the name “MA PAUL F”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MA PAUL F

APPLIED MATERIALS INC

Apparatus and method for providing uniform flow of gas

Vortex chamber lids for atomic layer deposition

Selective etch of metal nitride films

NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors

Cobalt deposition on barrier surfaces

Doping control of metal nitride films

Low thickness dependent work-function nMOS integration for metal gate

Methods for thermally forming a selective cobalt layer

Method and apparatus for protecting metal interconnect from halogen based precursors

Protective via cap for improved interconnect performance

Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof

Apparatus and method for providing uniform flow of gas

Methods to fill high aspect ratio features on semiconductor substrates with MOCVD cobalt film

Methods for forming a metal silicide interconnection nanowire structure

Methods for depositing dielectric barrier layers and aluminum containing etch stop layers

Direct deposition of nickel silicide nanowire

Methods for depositing manganese and manganese nitrides

Doping control of metal nitride films

Doping control of metal nitride films

Selective deposition defects removal by chemical etch

Method of depositing metals using high frequency plasma

Wafer treatment for achieving defect-free self-assembled monolayers

Methods for enhancing selectivity in SAM-based selective deposition

Apparatus and method for providing uniform flow of gas

Apparatus for depositing metal films with plasma treatment

Methods and materials for modifying the threshold voltage of metal oxide stacks

Methods and apparatus for cryogenic gas stream assisted SAM-based selective deposition

Methods for enhancing selectivity in SAM-based selective deposition

Methods for forming a metal silicide interconnection nanowire structure

Wafer treatment for achieving defect-free self-assembled monolayers

Apparatus and methods to remove residual precursor inside gas lines post-deposition

Doping control of metal nitride films

Doping control of metal nitride films

Aluminum content control of TiAIN films

Methods for manganese nitride integration

Doped tantalum nitride for copper barrier applications

Cobalt manganese vapor phase deposition

Methods and apparatus for doping engineering and threshold voltage tuning by integrated deposition of titanium nitride and aluminum films

Methods of depositing cobalt manganese films

Atomic layer deposition of hafnium or zirconium alloy films

Methods of reducing or eliminating defects in tungsten film

Methods for depositing dielectric barrier layers and aluminum containing etch stop layers

Gas feedthrough assembly

Methods and materials for modifying the threshold voltage of metal oxide stacks

Synthesis of metal nitride thin films materials using hydrazine derivatives

MA PAUL F

Selective atomic layer depositions

In-situ chamber treatment and deposition process

GANGULI SESHADRI

NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors

WEI GUODAN

Methods for depositing a tantalum silicon nitride film

CORNELL RES FOUNDATION INC

Growth of inorganic thin films using self-assembled monolayers as nucleation sites