Inventor
VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS
NL67 patents
⚠️ This page may combine multiple inventors who share the name “VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
29 patentsUS7903866B2Mar 8, 2011
Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object
ASML NETHERLANDS BV16 citations92
US10712667B2Jul 14, 2020
Optical device and associated system
ASML NETHERLANDS BV22 citations91
US11287242B2Mar 29, 2022
Cyclic error measurements and calibration procedures in interferometers
ASML NETHERLANDS BV7 citations84
US10466599B2Nov 5, 2019
Lithographic apparatus
ASML NETHERLANDS BV4 citations83
US7999912B2Aug 16, 2011
Lithographic apparatus and sensor calibration method
ASML NETHERLANDS BV7 citations81
US9470988B2Oct 18, 2016
Substrate positioning system, lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV10 citations78
US11940739B2Mar 26, 2024
Metrology apparatus
ASML NETHERLANDS BV1 citations72
US11262661B2Mar 1, 2022
Metrology apparatus
ASML NETHERLANDS BV4 citations72
US10976675B2Apr 13, 2021
Lithographic apparatus
ASML NETHERLANDS BV1 citations72
US10209634B2Feb 19, 2019
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV3 citations72
US9696638B2Jul 4, 2017
Lithographic apparatus
ASML NETHERLANDS BV3 citations72
US9529277B2Dec 27, 2016
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV3 citations71
US11719529B2Aug 8, 2023
Interferometer system, method of determining a mode hop of a laser source of an interferometer system, method of determining a position of a movable object, and lithographic apparatus
ASML NETHERLANDS BV2 citations66
US9268211B2Feb 23, 2016
Lithographic apparatus, and patterning device for use in a lithographic process
ASML NETHERLANDS BV2 citations63
US12591179B2Mar 31, 2026
Metrology apparatus
ASML NETHERLANDS BV0 citations62
US11914308B2Feb 27, 2024
Lithographic apparatus
ASML NETHERLANDS BV0 citations62
US11609503B2Mar 21, 2023
Lithographic apparatus
ASML NETHERLANDS BV0 citations62
US8368868B2Feb 5, 2013
Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless
ASML NETHERLANDS BV2 citations62
US10444635B2Oct 15, 2019
Lithographic method and apparatus
ASML NETHERLANDS BV1 citations59
US12247883B2Mar 11, 2025
Wavelength tracking system, method to calibrate a wavelength tracking system, lithographic apparatus, method to determine an absolute position of a movable object, and interferometer system
ASML NETHERLANDS BV0 citations53
US11476077B2Oct 18, 2022
Interferometric stage positioning apparatus
ASML NETHERLANDS BV0 citations51
US10571815B2Feb 25, 2020
Lithographic apparatus
ASML NETHERLANDS BV0 citations51
US10331045B2Jun 25, 2019
Position measurement system and lithographic apparatus
ASML NETHERLANDS BV0 citations51
US9915880B2Mar 13, 2018
Stage apparatus, lithographic apparatus and method of positioning an object table
ASML NETHERLANDS BV0 citations51
US9229340B2Jan 5, 2016
Lithographic apparatus
ASML NETHERLANDS BV0 citations51
US12147167B2Nov 19, 2024
Imprint apparatus with movable stages
ASML NETHERLANDS BV0 citations50
US10620553B2Apr 14, 2020
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations50
US10216102B2Feb 26, 2019
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations50
US9891542B2Feb 13, 2018
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations50
VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS
3 patentsUS8570492B2Oct 29, 2013
Lithographic apparatus
VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS6 citations82
US8730485B2May 20, 2014
Lithographic apparatus and device manufacturing method
VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS3 citations61
US9316928B2Apr 19, 2016
Stage apparatus, lithographic apparatus and method of positioning an object table
VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS0 citations50
VAN EIJK JAN
3 patentsUS8482719B2Jul 9, 2013
Positioning system, lithographic apparatus and method
VAN EIJK JAN6 citations71
US9019470B2Apr 28, 2015
Lithographic apparatus, and patterning device for use in a lithographic process
VAN EIJK JAN1 citations51
US8982359B2Mar 17, 2015
System for detecting motion, lithographic apparatus and device manufacturing method
VAN EIJK JAN0 citations51
BUTLER HANS
2 patentsZEISS CARL SMT GMBH
2 patentsKOENEN WILLEM HERMAN GERTRUDA ANNA
2 patentsUS8922756B2Dec 30, 2014
Position measurement system, lithographic apparatus and device manufacturing method
KOENEN WILLEM HERMAN GERTRUDA ANNA2 citations59
US8451454B2May 28, 2013
Stage system, lithographic apparatus including such stage system, and correction method
KOENEN WILLEM HERMAN GERTRUDA ANNA3 citations59
WESTERLAKEN JAN STEVEN CHRISTIAAN
1 patentVAN DE MAST FRANCISCUS
1 patentAARTS IGOR MATHEUS PETRONELLA
1 patentLOOPSTRA ERIK ROELOF
1 patentSTEIJAERT PETER PAUL
1 patentHUANG YANG-SHAN
1 patentKLAVER RENATUS GERARDUS
1 patentEUSSEN EMIEL JOZEF MELANIE
1 patentBEERENS RUUD ANTONIUS CATHARINA MARIA
1 patentShowing the top 50 of 67 patents by PatentIndex Score.