Inventor
SHIRALI NAGESH
US21 patents
Patents
21 patentsUS11062878B2Jul 13, 2021
Method and system for determining a charged particle beam exposure for a local pattern density
D2S INC5 citations83
US10748744B1Aug 18, 2020
Method and system for determining a charged particle beam exposure for a local pattern density
D2S INC5 citations83
US12019973B2Jun 25, 2024
Method for reticle enhancement technology of a design pattern to be manufactured on a substrate
D2S INC3 citations74
US11783110B2Oct 10, 2023
Method for reticle enhancement technology of a design pattern to be manufactured on a substrate
D2S INC3 citations73
US11756765B2Sep 12, 2023
Method and system for determining a charged particle beam exposure for a local pattern density
D2S INC2 citations71
US12372864B2Jul 29, 2025
Methods and systems to determine shapes for semiconductor or flat panel display fabrication
D2S INC1 citations62
US12340164B2Jun 24, 2025
Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrate
D2S INC0 citations62
US12248242B2Mar 11, 2025
Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrate
D2S INC0 citations62
US11953824B2Apr 9, 2024
Method for reticle enhancement technology of a design pattern to be manufactured on a substrate
D2S INC0 citations62
US11693306B2Jul 4, 2023
Method for reticle enhancement technology of a design pattern to be manufactured on a substrate
D2S INC0 citations62
US12579353B2Mar 17, 2026
Computing parasitic values for semiconductor designs
D2S INC0 citations61
US12499301B2Dec 16, 2025
Computing parasitic values for semiconductor designs
D2S INC0 citations61
US12488175B2Dec 2, 2025
Methods and systems to determine parasitics for semiconductor or flat panel display fabrication
D2S INC0 citations61
US12387029B2Aug 12, 2025
Computing parasitic values for semiconductor designs
D2S INC0 citations61
US12287567B2Apr 29, 2025
Method and system for reticle enhancement technology
D2S INC0 citations61
US11921420B2Mar 5, 2024
Method and system for reticle enhancement technology
D2S INC0 citations61
US11592802B2Feb 28, 2023
Method and system of reducing charged particle beam write time
D2S INC0 citations61
US10884395B2Jan 5, 2021
Method and system of reducing charged particle beam write time
D2S INC0 citations61
US12243712B2Mar 4, 2025
Method and system for determining a charged particle beam exposure for a local pattern density
D2S INC0 citations60
US11886166B2Jan 30, 2024
Method and system of reducing charged particle beam write time
D2S INC0 citations60
US11604451B2Mar 14, 2023
Method and system of reducing charged particle beam write time
D2S INC0 citations60