Inventor
ONVLEE JOHANNES
NL43 patents
⚠️ This page may combine multiple inventors who share the name “ONVLEE JOHANNES”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
26 patentsUS9335638B2May 10, 2016
Lithographic apparatus, programmable patterning device and lithographic method
ASML NETHERLANDS BV19 citations92
US7630118B2Dec 8, 2009
Spatial light modulator, method of spatially modulating a radiation beam, lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV13 citations84
US7511797B2Mar 31, 2009
Lithography system, control system and device manufacturing method
ASML NETHERLANDS BV9 citations82
US7352439B2Apr 1, 2008
Lithography system, control system and device manufacturing method
ASML NETHERLANDS BV10 citations81
US7195407B2Mar 27, 2007
Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing, cell and computer program
ASML NETHERLANDS BV10 citations80
US7433033B2Oct 7, 2008
Inspection method and apparatus using same
ASML NETHERLANDS BV7 citations73
US7068351B2Jun 27, 2006
Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing cell, and computer program
ASML NETHERLANDS BV8 citations70
US11994848B2May 28, 2024
Systems and methods for adjusting prediction models between facility locations
ASML NETHERLANDS BV2 citations69
US7184849B2Feb 27, 2007
Method of planning tasks in a machine, method of controlling a machine, supervisory machine control system, lithographic apparatus, lithographic processing cell and computer program
ASML NETHERLANDS BV7 citations66
US7714981B2May 11, 2010
Lithographic apparatus and method
ASML NETHERLANDS BV5 citations63
US7633600B2Dec 15, 2009
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV6 citations62
US7349082B2Mar 25, 2008
Particle detection device, lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV5 citations61
US12032301B2Jul 9, 2024
Substrate support, lithographic apparatus and loading method
ASML NETHERLANDS BV0 citations60
US11556063B2Jan 17, 2023
Substrate support, lithographic apparatus and loading method
ASML NETHERLANDS BV0 citations60
US7123349B2Oct 17, 2006
Lithographic projection assembly, substrate handling apparatus and substrate handling method
ASML NETHERLANDS BV5 citations60
US7283225B2Oct 16, 2007
Particle detection device, lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV2 citations57
US7756597B2Jul 13, 2010
Method of operating a lithographic processing machine, control system, lithographic apparatus, lithographic processing cell, and computer program
ASML NETHERLANDS BV4 citations54
US7933000B2Apr 26, 2011
Device manufacturing method, method for holding a patterning device and lithographic apparatus including an applicator for applying molecules onto a clamp area of a patterning device
ASML NETHERLANDS BV1 citations51
US9372412B2Jun 21, 2016
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations49
US7679714B2Mar 16, 2010
Lithographic apparatus, combination of lithographic apparatus and processing module, and device manufacturing method
ASML NETHERLANDS BV0 citations49
US8345225B2Jan 1, 2013
Controllable radiation lithographic apparatus and method
ASML NETHERLANDS BV0 citations42
US9857694B2Jan 2, 2018
Estimating deformation of a patterning device and/or a change in its position
ASML NETHERLANDS BV0 citations39
US7817241B2Oct 19, 2010
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations39
US10444647B2Oct 15, 2019
Methods and apparatus for determining the position of a target structure on a substrate, methods and apparatus for determining the position of a substrate
ASML NETHERLANDS BV0 citations35
US10031428B2Jul 24, 2018
Gas flow optimization in reticle stage environment
ASML NETHERLANDS BV0 citations35
US10459354B2Oct 29, 2019
Lithographic apparatus and lithographic projection method
ASML NETHERLANDS BV0 citations34
ASML HOLDING NV
6 patentsUS9632434B2Apr 25, 2017
Reticle cooling system in a lithographic apparatus
ASML HOLDING NV3 citations70
US9632433B2Apr 25, 2017
Patterning device support, lithographic apparatus, and method of controlling patterning device temperature
ASML HOLDING NV2 citations70
US9766557B2Sep 19, 2017
Patterning device support, lithographic apparatus, and method of controlling patterning device temperature
ASML HOLDING NV1 citations60
US12442759B2Oct 14, 2025
Contaminant analyzing metrology system, lithographic apparatus, and methods thereof
ASML HOLDING NV0 citations56
US9977351B2May 22, 2018
Patterning device support, lithographic apparatus, and method of controlling patterning device temperature
ASML HOLDING NV0 citations50
US10423081B2Sep 24, 2019
Reticle cooling by non-uniform gas flow
ASML HOLDING NV0 citations47
ONVLEE JOHANNES
3 patentsVAN ZWET ERWIN JOHN
3 patentsUS9316926B2Apr 19, 2016
Lithographic apparatus and device manufacturing method
VAN ZWET ERWIN JOHN1 citations47
US9235140B2Jan 12, 2016
Lithographic apparatus and device manufacturing method
VAN ZWET ERWIN JOHN0 citations47
US9134630B2Sep 15, 2015
Lithographic apparatus and device manufacturing method
VAN ZWET ERWIN JOHN1 citations47