Inventor

MONTANINI PIETRO

US58 patents

⚠️ This page may combine multiple inventors who share the name “MONTANINI PIETRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MONTANINI PIETRO

IBM

Sub-thermal switching slope vertical field effect transistor with dual-gate feedback loop mechanism

Nanosheet transistor device with bottom isolation

Vertical transport FET with bottom source and drain extensions

Nanosheet transistor with fully isolated source and drain regions and spacer pinch off

Sub-thermal switching slope vertical field effect transistor with dual-gate feedback loop mechanism

Dielectric isolation in gate-all-around devices

Dielectric isolation in gate-all-around devices

Removal of epitaxy defects in transistors

Extended lower source/drain for stacked field-effect transistor

Hybrid complementary field effect transistor device

Vertical field-effect transistor late gate recess process with improved inter-layer dielectric protection

Robust low-k bottom spacer for VFET

Vertical field-effect transistor late gate recess process with improved inter-layer dielectric protection

Wraparound contact with reduced distance to channel

Wrap-around contact for nanosheet device

Utilizing multilayer gate spacer to reduce erosion of semiconductor Fin during spacer patterning

Sub-thermal switching slope vertical field effect transistor with dual-gate feedback loop mechanism

Sub-thermal switching slope vertical field effect transistor with dual-gate feedback loop mechanism

Sub-thermal switching slope vertical field effect transistor with dual-gate feedback loop mechanism

Utilizing multilayer gate spacer to reduce erosion of semiconductor fin during spacer patterning

ST MICROELECTRONICS SRL

Process for manufacturing high-sensitivity accelerometric and gyroscopic integrated sensors, and sensor thus produced

Process for manufacturing high-sensitivity capacitive and resonant integrated sensors, particularly accelerometers and gyroscopes, and sensors made therefrom

Process for manufacturing high-sensitivity capacitive and resonant integrated sensors, particularly accelerometers and gyroscopes, and sensors made therefrom

Method for manufacturing integrated devices including electromechanical microstructures, without residual stress

Folded-gate MOS transistor

Integrated angular speed sensor device and production method thereof

Production method for integrated angular speed sensor device

Process for manufacturing high-sensitivity accelerometric and gyroscopic integrated sensors, and sensor thus produced

Method for manufacturing integrated structures including removing a sacrificial region

Method for manufacturing an SOI wafer

Method for manufacturing a vertical-gate MOS transistor with countersunk trench-gate

Method for manufacturing integrated structures including removing a sacrificial region

SOI device with contact trenches formed during epitaxial growing

Process for manufacturing high-sensitivity accelerometric and gyroscopic integrated sensors, and sensor thus produced

Front-rear contacts of electronics devices with induced defects to increase conductivity thereof

GLOBALFOUNDRIES INC

Methods of forming an isolated nano-sheet transistor device and the resulting device

Nanosheet devices with CMOS epitaxy and method of forming

Nanosheet devices with CMOS epitaxy and method of forming

FinFET spacer formation on gate sidewalls, between the channel and source/drain regions

Method of forming integrated circuit with gate-all-around field effect transistor and the resulting structure

Devices and methods of forming epi for aggressive gate pitch

ST MICROELECTRONICS INC

Embedded shape sige for strained channel transistors

Prevention of faceting in epitaxial source drain transistors

Precision polysilicon resistors

Embedded shape SiGe for strained channel transistors

Embedded shape sige for strained channel transistors

SGS THOMSON MICROELECTRONICS

Method of manufacturing pressure microsensors

PIRELLI & C SPA

Coupling structure for optical fibres and process for making it

INT BUSINESS MACHINES CORPORATION

Nanosheet epitaxy with full bottom isolation

MONTANINI PIETRO

Process for etching trenches in an integrated optical device