Inventor
Xiao-Li Yinying
US20 patents
⚠️ This page may combine multiple inventors who share the name “Xiao-Li Yinying”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA CORP
15 patentsUS10921261B2Feb 16, 2021
Strontium tetraborate as optical coating material
KLA CORP11 citations85
US11237455B2Feb 1, 2022
Frequency conversion using stacked strontium tetraborate plates
KLA CORP6 citations84
US11567391B1Jan 31, 2023
Frequency conversion using interdigitated nonlinear crystal gratings
KLA CORP5 citations72
US11543732B2Jan 3, 2023
Frequency conversion using stacked strontium tetraborate plates
KLA CORP2 citations72
US11360032B2Jun 14, 2022
Strontium tetraborate as optical coating material
KLA CORP4 citations72
US10943760B2Mar 9, 2021
Electron gun and electron microscope
KLA CORP2 citations71
US11715615B2Aug 1, 2023
Light modulated electron source
KLA CORP0 citations62
US11417492B2Aug 16, 2022
Light modulated electron source
KLA CORP0 citations62
US11255797B2Feb 22, 2022
Strontium tetraborate as optical glass material
KLA CORP1 citations62
US11424117B2Aug 23, 2022
Broadband ultraviolet illumination sources
KLA CORP0 citations61
US11011366B2May 18, 2021
Broadband ultraviolet illumination sources
KLA CORP1 citations61
US11815784B2Nov 14, 2023
United states frequency conversion using interdigitated nonlinear crystal gratings
KLA CORP0 citations60
US12340969B2Jun 24, 2025
Electron gun and electron microscope
KLA CORP0 citations55
US12379642B2Aug 5, 2025
Tunable DUV laser assembly
KLA CORP0 citations51
US11899338B2Feb 13, 2024
Deep ultraviolet laser using strontium tetraborate for frequency conversion
KLA CORP0 citations48
KLA TENCOR CORP
5 patentsUS10748730B2Aug 18, 2020
Photocathode including field emitter array on a silicon substrate with boron layer
KLA TENCOR CORP16 citations86
US10133181B2Nov 20, 2018
Electron source
KLA TENCOR CORP7 citations84
US10558123B2Feb 11, 2020
Electron source
KLA TENCOR CORP4 citations73
US9966230B1May 8, 2018
Multi-column electron beam lithography including field emitters on a silicon substrate with boron layer
KLA TENCOR CORP6 citations73
US11067389B2Jul 20, 2021
Overlay metrology system and method
KLA TENCOR CORP4 citations72