Inventor

FIELDEN JOHN

US141 patents

⚠️ This page may combine multiple inventors who share the name “FIELDEN JOHN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FIELDEN JOHN

KLA TENCOR TECH CORP

Methods and systems for determining a composition and a thickness of a specimen

Methods and systems for determining a critical dimension and overlay of a specimen

Methods and systems for determining at least four properties of a specimen

Methods and systems for determining a critical dimension and overlay of a specimen

Apparatus and methods for detecting overlay errors using scatterometry

Methods and systems for determining a presence of defects and a thin film characteristic of a specimen

Methods and systems for determining a critical dimension, a presence of defects, and a thin film characteristic of a specimen

Methods and systems for determining a critical dimension an a presence of defects on a specimen

Methods and systems for determining a property of a specimen prior to, during, or subsequent to an etch process

Methods and systems for determining at least one characteristic of defects on at least two sides of a specimen

Systems and methods for measurement of a specimen with vacuum ultraviolet light

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Methods and systems for determining a thin film characteristic and an electrical property of a specimen

Methods and systems for determining overlay and flatness of a specimen

Methods and systems for determining a thickness of a structure on a specimen and at least one additional property of the specimen

Methods and systems for determining flatness, a presence of defects, and a thin film characteristic of a specimen

Methods and systems for determining an implant characteristic and a presence of defects on a specimen

Methods and systems for determining a presence of macro defects and overlay of a specimen

Methods and systems for determining a presence of macro and micro defects on a specimen

Methods and systems for determining a property of a specimen prior to, during, or subsequent to lithography

Methods and systems for determining an adhesion characteristic and a thickness of a specimen

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Systems and methods for measurement of a specimen with vacuum ultraviolet light

KLA TENCOR CORP

193NM laser and inspection system

High brightness X-ray metrology

In-situ metalization monitoring using eddy current and optical measurements

In-situ metalization monitoring using eddy current measurements during the process for removing the film

In-situ metalization monitoring using eddy current measurements during the process for removing the film

193 nm laser and an inspection system using a 193 nm laser

193nm laser and inspection system

Method and system for determining one or more optical characteristics of structure of a semiconductor wafer

Photocathode including silicon substrate with boron layer

Back-illuminated sensor with boron layer

Photomultiplier tube, image sensor, and an inspection system using a PMT or image sensor

Anti-reflection layer for back-illuminated sensor

Bright and dark field scatterometry systems for line roughness metrology

Systems and methods for near-field heterodyne spectroscopy

KLA TENCOR TECHNOLOGIES

Methods and systems for determining a critical dimension and a thin film characteristic of a specimen

Methods and systems for determining a presence of macro defects and overlay of a specimen

Methods and systems for determining a characteristic of a layer formed on a specimen by a deposition process

ADEL MICHAEL

Feedforward/feedback litho process control of stress and overlay

Feedforward/feedback litho process control of stress and overlay

LAM RES CORP

Method and apparatus for in-situ monitoring of thickness using a multi-wavelength spectrometer during chemical-mechanical polishing

LEVY ADY

Methods and systems for determining a critical dimension and overlay of a specimen

K L A TENCOR TECHNOLOGIES

Methods and systems for determining a presence of macro and micro defects on a specimen

KLA TENCOR INC

Methods and systems for determining a characteristic of a specimen prior to, during, or subsequent to ion implantation

DRIBINSKI VLADIMIR

Laser with high quality, stable output beam, and long life high conversion efficiency non-linear crystal