Inventor
LEU PO-HSIUNG
TW23 patents
⚠️ This page may combine multiple inventors who share the name “LEU PO-HSIUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
17 patentsUS10533252B2Jan 14, 2020
Showerhead, semicondcutor processing apparatus having the same and semiconductor process
TAIWAN SEMICONDUCTOR MFG CO LTD10 citations82
US10161041B2Dec 25, 2018
Thermal chemical vapor deposition system and operating method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations79
US10867787B2Dec 15, 2020
Method for controlling plasma in semiconductor fabrication
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations70
US10864530B2Dec 15, 2020
Coating apparatus and method of forming coating film
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations69
US9573144B2Feb 21, 2017
Coating apparatus and method of forming coating film
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations69
US10626499B2Apr 21, 2020
Deposition device structure
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations57
US9831307B2Nov 28, 2017
Gap fill self planarization on post EPI
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9536771B2Jan 3, 2017
Gap fill self planarization on post EPI
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9953861B2Apr 24, 2018
Semiconductor device having a shallow trench isolation structure and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US9209071B2Dec 8, 2015
Semiconductor structure with anti-etch structure in via and method for manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US10395918B2Aug 27, 2019
Method and system for controlling plasma in semiconductor fabrication
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
US9324559B2Apr 26, 2016
Thin film deposition apparatus with multi chamber design and film deposition methods
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48
US9048185B2Jun 2, 2015
Profile pre-shaping for replacement poly gate interlayer dielectric
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48
US10867838B2Dec 15, 2020
Semiconductor device having a shallow trench isolation structure and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations47
US10724140B2Jul 28, 2020
Thermal chemical vapor deposition system and operating method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations47
US10164063B2Dec 25, 2018
Semiconductor structure with protection layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations41
US9607809B2Mar 28, 2017
High density plasma reactor with multiple top coils
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations32
TAIWAN SEMICONDUCTOR MFG
3 patentsUS9356120B2May 31, 2016
Metal gate transistor and method for tuning metal gate profile
TAIWAN SEMICONDUCTOR MFG10 citations82
US6897147B1May 24, 2005
Solution for copper hillock induced by thermal strain with buffer zone for strain relaxation
TAIWAN SEMICONDUCTOR MFG8 citations68
US8946095B2Feb 3, 2015
Method of forming interlayer dielectric film above metal gate of semiconductor device
TAIWAN SEMICONDUCTOR MFG1 citations49