Inventor
HSU KAI-SHIUNG
TW16 patents
⚠️ This page may combine multiple inventors who share the name “HSU KAI-SHIUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
15 patentsUS10161041B2Dec 25, 2018
Thermal chemical vapor deposition system and operating method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations79
US11315829B2Apr 26, 2022
Amorphous layers for reducing copper diffusion and method forming same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US12444647B2Oct 14, 2025
Electron migration control in interconnect structures
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12354907B2Jul 8, 2025
Electron migration control in interconnect structures
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11264273B2Mar 1, 2022
Electron migration control in interconnect structures
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12354908B2Jul 8, 2025
Amorphous layers for reducing copper diffusion and method forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11967522B2Apr 23, 2024
Amorphous layers for reducing copper diffusion and method forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12148656B2Nov 19, 2024
Method of manufacturing semiconductor device and semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations58
US11322397B2May 3, 2022
Method of manufacturing semiconductor devices including formation of adhesion enhancement layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations58
US12020947B2Jun 25, 2024
Method of manufacturing semiconductor devices and semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations57
US11069534B2Jul 20, 2021
Method of manufacturing semiconductor devices and semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations57
US10626499B2Apr 21, 2020
Deposition device structure
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations57
US10978337B2Apr 13, 2021
Aluminum-containing layers and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations56
US12406867B2Sep 2, 2025
Split valve air curtain
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations55
US10724140B2Jul 28, 2020
Thermal chemical vapor deposition system and operating method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations47