Inventor

PLATZGUMMER ELMAR

AT51 patents

⚠️ This page may combine multiple inventors who share the name “PLATZGUMMER ELMAR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PLATZGUMMER ELMAR

IMS NANOFABRICATION AG

Method for maskless particle-beam exposure

Compensation of imaging deviations in a particle-beam writer using a convolution kernel

Method for charged-particle multi-beam exposure

Method for multi-beam exposure on a target

Particle-beam exposure apparatus with overall-modulation of a patterned beam

Customizing a particle-beam writer using a convolution kernel

Pattern definition device having multiple blanking arrays

Pattern definition device having distinct counter-electrode array plate

Compensation of dose inhomogeneity using overlapping exposure spots

Multi-beam writing of pattern areas of relaxed critical dimension

Compensation of defective beamlets in a charged-particle multi-beam exposure tool

Multi-beam deflector array device for maskless particle-beam processing

Multi-beam tool for cutting patterns

Bi-directional double-pass multi-beam writing

High-voltage insulation device for charged-particle optical apparatus

Charged-particle exposure apparatus

Correction of short-range dislocations in a multi-beam writer

IMS NANOFABRICATION GMBH

Particle-optical projection system

Maskless particle-beam system for exposing a pattern on a substrate

Advanced pattern definition for particle-beam processing

Charged-particle multi-beam exposure apparatus

Multi-beam writing using inclined exposure stripes

Method for compensating pattern placement errors caused by variation of pattern exposure density in a multi-beam writer

Non-linear dose- and blur-dependent edge placement correction

Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatus

Charged-particle source and method for cleaning a charged-particle source using back-sputtering

Advanced dose-level quantization of multibeam-writers

Method for irradiating a target using restricted placement grids

Pattern data processing for programmable direct-write apparatus

Beam pattern device having beam absorber structure

PLATZGUMMER ELMAR

Method for maskless particle-beam exposure

Pattern definition device with multiple multibeam array

Multi-beam source

Method for producing a multi-beam deflector array device having electrodes

Multi-beam deflector array means with bonded electrodes

Charged-particle exposure apparatus with electrostatic zone plate

Compensation of dose inhomogeneity and image distortion

Global point spreading function in multi-beam patterning

ZEISS CARL SMS GMBH

Advanced pattern definition for particle-beam exposure

Charged particle beam exposure system and beam manipulating arrangement

Charged particle beam exposure system

Particle-optical system

Charged particle system

FRAGNER HEINRICH

Method for maskless particle-beam exposure

Constant current multi-beam patterning

IMS IONEN MIKROFAB SYST

Apparatus for enhancing the lifetime of stencil masks

Ion irradiation of a target at very high and very low kinetic ion energies

IMS IONEN MIKROFABRIKATIONAS S

Method of synthesising carbon nano tubes

IMS INNENMIKROFABRIKATIONS SYS

Particle multibeam lithography

IMS NANOFABRICATIONS AG

Charged-particle exposure apparatus