Inventor
OUVRARD CEDRIC
AT22 patents
⚠️ This page may combine multiple inventors who share the name “OUVRARD CEDRIC”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INFINEON TECHNOLOGIES AUSTRIA AG
18 patentsUS9680004B2Jun 13, 2017
Power MOSFET with seperate gate and field plate trenches
INFINEON TECHNOLOGIES AUSTRIA AG12 citations84
US11158735B2Oct 26, 2021
Charge compensation MOSFET with graded epi profile and methods of manufacturing thereof
INFINEON TECHNOLOGIES AUSTRIA AG3 citations73
US10872957B2Dec 22, 2020
Semiconductor device with needle-shaped field plate structures
INFINEON TECHNOLOGIES AUSTRIA AG1 citations73
US10510846B2Dec 17, 2019
Semiconductor device with needle-shaped field plate structures in a transistor cell region and in an inner termination region
INFINEON TECHNOLOGIES AUSTRIA AG3 citations73
US10269953B2Apr 23, 2019
Semiconductor device having a trench gate
INFINEON TECHNOLOGIES AUSTRIA AG3 citations72
US10629595B2Apr 21, 2020
Power semiconductor device having different gate crossings, and method for manufacturing thereof
INFINEON TECHNOLOGIES AUSTRIA AG2 citations70
US10727331B2Jul 28, 2020
Semiconductor device having a reduced surface doping in an edge termination area, and method for manufacturing thereof
INFINEON TECHNOLOGIES AUSTRIA AG1 citations62
US10453929B2Oct 22, 2019
Methods of manufacturing a power MOSFET
INFINEON TECHNOLOGIES AUSTRIA AG0 citations52
US10050113B2Aug 14, 2018
Semiconductor device with needle-shaped field plates and a gate structure with edge and node portions
INFINEON TECHNOLOGIES AUSTRIA AG1 citations52
US11296218B2Apr 5, 2022
Semiconductor device
INFINEON TECHNOLOGIES AUSTRIA AG0 citations51
US10868173B2Dec 15, 2020
Semiconductor device having an edge termination area with trench electrodes at different electric potentials, and method for manufacturing thereof
INFINEON TECHNOLOGIES AUSTRIA AG0 citations51
US10811531B2Oct 20, 2020
Transistor device with gate resistor
INFINEON TECHNOLOGIES AUSTRIA AG0 citations51
US10205015B2Feb 12, 2019
Reduced gate charge field-effect transistor
INFINEON TECHNOLOGIES AUSTRIA AG0 citations51
US9865726B2Jan 9, 2018
Method of manufacturing a semiconductor device with trench gate by using a screen oxide layer
INFINEON TECHNOLOGIES AUSTRIA AG1 citations51
US9755066B2Sep 5, 2017
Reduced gate charge field-effect transistor
INFINEON TECHNOLOGIES AUSTRIA AG1 citations51
US10573731B2Feb 25, 2020
Semiconductor transistor and method for forming the semiconductor transistor
INFINEON TECHNOLOGIES AUSTRIA AG0 citations49
US9799738B2Oct 24, 2017
Semiconductor device with field electrode and contact structure
INFINEON TECHNOLOGIES AUSTRIA AG0 citations41
US10879363B2Dec 29, 2020
Needle cell trench MOSFET
INFINEON TECHNOLOGIES AUSTRIA AG0 citations37
INFINEON TECHNOLOGIES AG
3 patentsUS9029974B2May 12, 2015
Semiconductor device, junction field effect transistor and vertical field effect transistor
INFINEON TECHNOLOGIES AG3 citations62
US9711660B2Jul 18, 2017
JFET and method of manufacturing thereof
INFINEON TECHNOLOGIES AG1 citations52
US9276135B2Mar 1, 2016
Junction field effect transistor with vertical PN junction
INFINEON TECHNOLOGIES AG0 citations52