P

Inventor

OUVRARD CEDRIC

AT22 patents
⚠️ This page may combine multiple inventors who share the name “OUVRARD CEDRIC”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

INFINEON TECHNOLOGIES AUSTRIA AG

18 patents
US9680004B2Jun 13, 2017

Power MOSFET with seperate gate and field plate trenches

INFINEON TECHNOLOGIES AUSTRIA AG12 citations84
US11158735B2Oct 26, 2021

Charge compensation MOSFET with graded epi profile and methods of manufacturing thereof

INFINEON TECHNOLOGIES AUSTRIA AG3 citations73
US10872957B2Dec 22, 2020

Semiconductor device with needle-shaped field plate structures

INFINEON TECHNOLOGIES AUSTRIA AG1 citations73
US10510846B2Dec 17, 2019

Semiconductor device with needle-shaped field plate structures in a transistor cell region and in an inner termination region

INFINEON TECHNOLOGIES AUSTRIA AG3 citations73
US10269953B2Apr 23, 2019

Semiconductor device having a trench gate

INFINEON TECHNOLOGIES AUSTRIA AG3 citations72
US10629595B2Apr 21, 2020

Power semiconductor device having different gate crossings, and method for manufacturing thereof

INFINEON TECHNOLOGIES AUSTRIA AG2 citations70
US10727331B2Jul 28, 2020

Semiconductor device having a reduced surface doping in an edge termination area, and method for manufacturing thereof

INFINEON TECHNOLOGIES AUSTRIA AG1 citations62
US10453929B2Oct 22, 2019

Methods of manufacturing a power MOSFET

INFINEON TECHNOLOGIES AUSTRIA AG0 citations52
US10050113B2Aug 14, 2018

Semiconductor device with needle-shaped field plates and a gate structure with edge and node portions

INFINEON TECHNOLOGIES AUSTRIA AG1 citations52
US11296218B2Apr 5, 2022

Semiconductor device

INFINEON TECHNOLOGIES AUSTRIA AG0 citations51
US10868173B2Dec 15, 2020

Semiconductor device having an edge termination area with trench electrodes at different electric potentials, and method for manufacturing thereof

INFINEON TECHNOLOGIES AUSTRIA AG0 citations51
US10811531B2Oct 20, 2020

Transistor device with gate resistor

INFINEON TECHNOLOGIES AUSTRIA AG0 citations51
US10205015B2Feb 12, 2019

Reduced gate charge field-effect transistor

INFINEON TECHNOLOGIES AUSTRIA AG0 citations51
US9865726B2Jan 9, 2018

Method of manufacturing a semiconductor device with trench gate by using a screen oxide layer

INFINEON TECHNOLOGIES AUSTRIA AG1 citations51
US9755066B2Sep 5, 2017

Reduced gate charge field-effect transistor

INFINEON TECHNOLOGIES AUSTRIA AG1 citations51
US10573731B2Feb 25, 2020

Semiconductor transistor and method for forming the semiconductor transistor

INFINEON TECHNOLOGIES AUSTRIA AG0 citations49
US9799738B2Oct 24, 2017

Semiconductor device with field electrode and contact structure

INFINEON TECHNOLOGIES AUSTRIA AG0 citations41
US10879363B2Dec 29, 2020

Needle cell trench MOSFET

INFINEON TECHNOLOGIES AUSTRIA AG0 citations37

INFINEON TECHNOLOGIES AG

3 patents

INFINEON TECHNOLOGIES AUSTRIA

1 patent