Inventor
LIN CHUNG-TE
TW321 patents
⚠️ This page may combine multiple inventors who share the name “LIN CHUNG-TE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
40 patentsUS11423966B2Aug 23, 2022
Memory array staircase structure
TAIWAN SEMICONDUCTOR MFG CO LTD23 citations95
US11171157B1Nov 9, 2021
Method for forming a MFMIS memory device
TAIWAN SEMICONDUCTOR MFG CO LTD26 citations94
US10644231B2May 5, 2020
Memory device and fabrication method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD22 citations94
US10522642B2Dec 31, 2019
Semiconductor device with air-spacer
TAIWAN SEMICONDUCTOR MFG CO LTD30 citations94
US10276794B1Apr 30, 2019
Memory device and fabrication method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD18 citations94
US9431381B2Aug 30, 2016
System and method of processing cutting layout and example switching circuit
TAIWAN SEMICONDUCTOR MFG CO LTD11 citations93
US11791335B2Oct 17, 2023
Method for forming semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations86
US11776602B2Oct 3, 2023
Memory array staircase structure
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations86
US11587823B2Feb 21, 2023
Three-dimensional memory device and method
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations86
US11411025B2Aug 9, 2022
3D ferroelectric memory
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations86
US11355516B2Jun 7, 2022
Three-dimensional memory device and method
TAIWAN SEMICONDUCTOR MFG CO LTD11 citations86
US11342015B1May 24, 2022
Memory device and memory circuit
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations86
US11309353B2Apr 19, 2022
Spacer-defined back-end transistor as memory selector
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations86
US10756174B2Aug 25, 2020
Multiple-stacked semiconductor nanowires and source/drain spacers
TAIWAN SEMICONDUCTOR MFG CO LTD11 citations86
US11527649B1Dec 13, 2022
Ferroelectric field effect transistor devices and methods for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations85
US10991756B2Apr 27, 2021
Bipolar selector with independently tunable threshold voltages
TAIWAN SEMICONDUCTOR MFG CO LTD11 citations85
US11527553B2Dec 13, 2022
Three-dimensional memory device and method
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US11495618B2Nov 8, 2022
Three-dimensional memory device and method
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US11404476B2Aug 2, 2022
Bipolar selector with independently tunable threshold voltages
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US11282572B2Mar 22, 2022
Multinary bit cells for memory devices and network applications and method of manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US11037952B2Jun 15, 2021
Peripheral circuitry under array memory device and method of fabricating thereof
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US11018134B2May 25, 2021
Semiconductor device and method for manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US10700125B2Jun 30, 2020
Integrated system chip with magnetic module
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US10636963B2Apr 28, 2020
Magnetic tunnel junctions
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10629501B2Apr 21, 2020
Gate all-around semiconductor device including a first nanowire structure and a second nanowire structure
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations84
US10170378B2Jan 1, 2019
Gate all-around semiconductor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US9899263B2Feb 20, 2018
Method of forming layout design
TAIWAN SEMICONDUCTOR MFG CO LTD13 citations84
US9412700B2Aug 9, 2016
Semiconductor device and method of manufacturing semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US11647634B2May 9, 2023
Three-dimensional memory device and method
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations75
US12127489B2Oct 22, 2024
Integrated circuit structure
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US12089415B2Sep 10, 2024
Metal layers for increasing polarization of ferroelectric memory device
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12058869B2Aug 6, 2024
Semiconductor structure with a logic device and a memory device being formed in different levels, and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11910616B2Feb 20, 2024
Three-dimensional memory device and method
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11903216B2Feb 13, 2024
Three-dimensional memory device and method
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11818896B2Nov 14, 2023
Cocktail layer over gate dielectric layer of FET FeRAM
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11805658B2Oct 31, 2023
Magnetic random access memory and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11800718B2Oct 24, 2023
Semiconductor memory device with gate line passing through source/drain, channel and dielectric layers over via
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11792999B2Oct 17, 2023
Bipolar selector with independently tunable threshold voltages
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11749341B2Sep 5, 2023
Multinary bit cells for memory devices and network applications and method of manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11744080B2Aug 29, 2023
Three-dimensional memory device with word lines extending through sub-arrays, semiconductor device including the same and method for manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
TAIWAN SEMICONDUCTOR MFG
10 patentsUS6444544B1Sep 3, 2002
Method of forming an aluminum protection guard structure for a copper metal structure
TAIWAN SEMICONDUCTOR MFG76 citations96
US6063695AMay 16, 2000
Simplified process for the fabrication of deep clear laser marks using a photoresist mask
TAIWAN SEMICONDUCTOR MFG57 citations94
US6287926B1Sep 11, 2001
Self aligned channel implant, elevated S/D process by gate electrode damascene
TAIWAN SEMICONDUCTOR MFG36 citations92
US6057207AMay 2, 2000
Shallow trench isolation process using chemical-mechanical polish with self-aligned nitride mask on HDP-oxide
TAIWAN SEMICONDUCTOR MFG45 citations92
US7432149B2Oct 7, 2008
CMOS on SOI substrates with hybrid crystal orientations
TAIWAN SEMICONDUCTOR MFG33 citations91
US6444541B1Sep 3, 2002
Method for forming lining oxide in shallow trench isolation incorporating pre-annealing step
TAIWAN SEMICONDUCTOR MFG23 citations89
US6194285B1Feb 27, 2001
Formation of shallow trench isolation (STI)
TAIWAN SEMICONDUCTOR MFG35 citations89
US9336348B2May 10, 2016
Method of forming layout design
TAIWAN SEMICONDUCTOR MFG13 citations84
US7943961B2May 17, 2011
Strain bars in stressed layers of MOS devices
TAIWAN SEMICONDUCTOR MFG12 citations84
US7449386B2Nov 11, 2008
Manufacturing method for semiconductor device to mitigate short channel effects
TAIWAN SEMICONDUCTOR MFG9 citations82
Showing the top 50 of 321 patents by PatentIndex Score.