Inventor
MANNA PRAMIT
US85 patents
Patents
50 patentsUS10017856B1Jul 10, 2018
Flowable gapfill using solvents
APPLIED MATERIALS INC340 citations98
US9412613B2Aug 9, 2016
Development of high etch selective hardmask material by ion implantation into amorphous carbon films
APPLIED MATERIALS INC54 citations98
US10529585B2Jan 7, 2020
Dry stripping of boron carbide hardmask
APPLIED MATERIALS INC19 citations94
US9721784B2Aug 1, 2017
Ultra-conformal carbon film deposition
APPLIED MATERIALS INC29 citations93
US10636669B2Apr 28, 2020
Seam healing using high pressure anneal
APPLIED MATERIALS INC15 citations86
US10886140B2Jan 5, 2021
3D NAND etch
APPLIED MATERIALS INC9 citations84
US10745282B2Aug 18, 2020
Diamond-like carbon film
APPLIED MATERIALS INC4 citations84
US10460933B2Oct 29, 2019
Two-step process for gapfilling high aspect ratio trenches with amorphous silicon film
APPLIED MATERIALS INC5 citations84
US10192775B2Jan 29, 2019
Methods for gapfill in high aspect ratio structures
APPLIED MATERIALS INC7 citations84
US11842897B2Dec 12, 2023
High density carbon films for patterning applications
APPLIED MATERIALS INC2 citations73
US11469097B2Oct 11, 2022
Carbon hard masks for patterning applications and methods related thereto
APPLIED MATERIALS INC2 citations73
US11043372B2Jun 22, 2021
High-density low temperature carbon films for hardmask and other patterning applications
APPLIED MATERIALS INC4 citations73
US11028477B2Jun 8, 2021
Bottom-up gap-fill by surface poisoning treatment
APPLIED MATERIALS INC4 citations73
US10954129B2Mar 23, 2021
Diamond-like carbon as mandrel
APPLIED MATERIALS INC3 citations73
US10910381B2Feb 2, 2021
Multicolor approach to DRAM STI active cut patterning
APPLIED MATERIALS INC1 citations73
US10626495B2Apr 21, 2020
Bottom-up growth of silicon oxide and silicon nitride using sequential deposition-etch-treat processing
APPLIED MATERIALS INC2 citations73
US10529568B2Jan 7, 2020
PECVD tungsten containing hardmask films and methods of making
APPLIED MATERIALS INC2 citations73
US10312137B2Jun 4, 2019
Hardmask layer for 3D NAND staircase structure in semiconductor applications
APPLIED MATERIALS INC2 citations73
US9865459B2Jan 9, 2018
Plasma treatment to improve adhesion between hardmask film and silicon oxide film
APPLIED MATERIALS INC5 citations73
US9640400B1May 2, 2017
Conformal doping in 3D si structure using conformal dopant deposition
APPLIED MATERIALS INC3 citations73
US9624577B2Apr 18, 2017
Deposition of metal doped amorphous carbon film
APPLIED MATERIALS INC2 citations73
US9406509B2Aug 2, 2016
Deposition of heteroatom-doped carbon films
APPLIED MATERIALS INC5 citations73
US11158507B2Oct 26, 2021
In-situ high power implant to relieve stress of a thin film
APPLIED MATERIALS INC2 citations72
US11557466B2Jan 17, 2023
Tuneable uniformity control utilizing rotational magnetic housing
APPLIED MATERIALS INC2 citations71
US10074534B2Sep 11, 2018
Ultra-conformal carbon film deposition
APPLIED MATERIALS INC5 citations71
US11721545B2Aug 8, 2023
Method of using dual frequency RF power in a process chamber
APPLIED MATERIALS INC2 citations70
US11236418B2Feb 1, 2022
Bottom-up growth of silicon oxide and silicon nitride using sequential deposition-etch-treat processing
APPLIED MATERIALS INC0 citations63
US11043379B2Jun 22, 2021
Conformal carbon film deposition
APPLIED MATERIALS INC1 citations63
US10176980B2Jan 8, 2019
Selective deposition of silicon oxide films
APPLIED MATERIALS INC1 citations63
US12486577B2Dec 2, 2025
Pulsed plasma (DC/RF) deposition of high quality C films for patterning
APPLIED MATERIALS INC0 citations62
US12463036B2Nov 4, 2025
High density carbon films for patterning applications
APPLIED MATERIALS INC0 citations62
US12173413B2Dec 24, 2024
High pressure oxidation of metal films
APPLIED MATERIALS INC0 citations62
US11784042B2Oct 10, 2023
Carbon hard masks for patterning applications and methods related thereto
APPLIED MATERIALS INC0 citations62
US11699585B2Jul 11, 2023
Methods of forming hardmasks
APPLIED MATERIALS INC0 citations62
US11676858B2Jun 13, 2023
High bias deposition of high quality gapfill
APPLIED MATERIALS INC1 citations62
US11664226B2May 30, 2023
Methods for producing high-density carbon films for hardmasks and other patterning applications
APPLIED MATERIALS INC1 citations62
US11664214B2May 30, 2023
Methods for producing high-density, nitrogen-doped carbon films for hardmasks and other patterning applications
APPLIED MATERIALS INC0 citations62
US11638374B2Apr 25, 2023
Multicolor approach to DRAM STI active cut patterning
APPLIED MATERIALS INC0 citations62
US11603591B2Mar 14, 2023
Pulsed plasma (DC/RF) deposition of high quality C films for patterning
APPLIED MATERIALS INC0 citations62
US11594415B2Feb 28, 2023
PECVD tungsten containing hardmask films and methods of making
APPLIED MATERIALS INC0 citations62
US11578409B2Feb 14, 2023
Low deposition rates for flowable PECVD
APPLIED MATERIALS INC0 citations62
US11557478B2Jan 17, 2023
In-situ high power implant to relieve stress of a thin film
APPLIED MATERIALS INC0 citations62
US11488856B2Nov 1, 2022
Methods for gapfill in high aspect ratio structures
APPLIED MATERIALS INC0 citations62
US11430655B2Aug 30, 2022
Low temperature high-quality dielectric films
APPLIED MATERIALS INC0 citations62
US11332376B2May 17, 2022
Diamond-like carbon film
APPLIED MATERIALS INC0 citations62
US11335690B2May 17, 2022
Multicolor approach to DRAM STI active cut patterning
APPLIED MATERIALS INC0 citations62
US11177128B2Nov 16, 2021
Apparatus and methods for manufacturing semiconductor structures using protective barrier layer
APPLIED MATERIALS INC0 citations62
US11131015B2Sep 28, 2021
High pressure oxidation of metal films
APPLIED MATERIALS INC1 citations62
US11062939B2Jul 13, 2021
High bias deposition of high quality gapfill
APPLIED MATERIALS INC1 citations62
US11011384B2May 18, 2021
Gapfill using reactive anneal
APPLIED MATERIALS INC0 citations62
Showing the top 50 of 85 patents by PatentIndex Score.