Inventor
HASHIMOTO MICHIAKI
JP17 patents
⚠️ This page may combine multiple inventors who share the name “HASHIMOTO MICHIAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
13 patentsUS6319649B1Nov 20, 2001
Photosensitive resin composition and method of forming resist images
HITACHI LTD31 citations92
US4273842AJun 16, 1981
Process for forming patternwise coated powder layer
HITACHI LTD36 citations92
US4412236AOct 25, 1983
Color solid-state imager
HITACHI LTD27 citations82
US4395629AJul 26, 1983
Solid-state color imager and method of manufacturing the same
HITACHI LTD26 citations82
US4311773AJan 19, 1982
Method of producing color filters
HITACHI LTD24 citations82
US4835089AMay 30, 1989
Resist pattern forming process with dry etching
HITACHI LTD22 citations81
US5024920AJun 18, 1991
Process for forming a pattern using a photosensitive azide and a high-molecular weight copolymer or polymer
HITACHI LTD12 citations73
US4985344AJan 15, 1991
Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer
HITACHI LTD14 citations73
US4285007AAug 18, 1981
Color solid-state imager and method of making the same
HITACHI LTD17 citations73
US4241162ADec 23, 1980
Light sensitive photoresist materials
HITACHI LTD15 citations72
US4430400AFeb 7, 1984
Method of producing color filters using dehydrating solution
HITACHI LTD3 citations60
US5290666AMar 1, 1994
Method of forming a positive photoresist pattern utilizing contrast enhancement overlayer containing trifluoromethanesulfonic, methanesulfonic or trifluoromethaneacetic aromatic diazonium salt
HITACHI LTD5 citations56
US4983500AJan 8, 1991
Radiation imaging process for formation of contrast enhanced pattern using two photosensitive dialonium salt layers with removal of overlayer and developed resist pattern in underlayer
HITACHI LTD0 citations37
HITACHI CHEMICAL CO LTD
4 patentsUS4565768AJan 21, 1986
Photosensitive azide composition with alkali soluble polymer and process of using to form resist pattern
HITACHI CHEMICAL CO LTD67 citations96
US5314783AMay 24, 1994
Photosensitive quinone diazide and resin composition having high absorbency for a wavelength of 365 nm containing a benzotriazole ultraviolet absorbing compound
HITACHI CHEMICAL CO LTD8 citations73
US4728594AMar 1, 1988
Photosensitive composition with azide or bisazide compound with oxazolone group
HITACHI CHEMICAL CO LTD11 citations73
US5215858AJun 1, 1993
Photosensitive resin composition and pattern formation using the same
HITACHI CHEMICAL CO LTD2 citations62