Inventor
LU CHUN-FU
TW23 patents
⚠️ This page may combine multiple inventors who share the name “LU CHUN-FU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IND TECH RES INST
10 patentsUS6703173B2Mar 9, 2004
Color filters for liquid crystal display panels and method of producing the same
IND TECH RES INST83 citations95
US6844120B2Jan 18, 2005
Micro-fluidic manufacturing method for forming a color filter
IND TECH RES INST14 citations81
US7108360B2Sep 19, 2006
Structure of stacked inkjet head
IND TECH RES INST7 citations67
US7842201B2Nov 30, 2010
System for manufacturing micro-retarder and method for manufacturing the same
IND TECH RES INST2 citations62
US7744192B2Jun 29, 2010
Nozzle plate of a spray apparatus
IND TECH RES INST2 citations62
US7931356B2Apr 26, 2011
Nozzle plate
IND TECH RES INST2 citations60
US7690214B2Apr 6, 2010
Micro-spray cooling system
IND TECH RES INST6 citations60
US7520595B2Apr 21, 2009
Droplet ejecting head
IND TECH RES INST2 citations60
US7926738B2Apr 19, 2011
Liquid nebulization system
IND TECH RES INST0 citations51
US7841847B2Nov 30, 2010
System for manufacturing micro-retarder and method for manufacturing the same
IND TECH RES INST1 citations51
TAIWAN SEMICONDUCTOR MFG CO LTD
9 patentsUS12119391B2Oct 15, 2024
Fin-based semiconductor device structure including self-aligned contacts and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11563109B2Jan 24, 2023
Semiconductor device structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12477766B2Nov 18, 2025
Semiconductor transistor device structure including nanostructure and gate structure with protection layer and fill layer and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12266544B2Apr 1, 2025
Reversed tone patterning method for dipole incorporation for multiple threshold voltages
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11996298B2May 28, 2024
Reversed tone patterning method for dipole incorporation for multiple threshold voltages
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12575133B2Mar 10, 2026
Transistor device with work function metal layers and method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12288695B2Apr 29, 2025
Method of forming a transistor device having dipole-containing gate dielectric layer and fluorine-containing gate dielectric layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12087771B2Sep 10, 2024
Multiple patterning gate scheme for nanosheet rule scaling
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US11862700B2Jan 2, 2024
Semiconductor device structure including forksheet transistors and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52