Inventor

GSCHWANDTNER ALEXANDER

DE10 patents

⚠️ This page may combine multiple inventors who share the name “GSCHWANDTNER ALEXANDER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SIEMENS AG

3 patents

US5281302AJan 25, 1994

Method for cleaning reaction chambers by plasma etching

SIEMENS AG87 citations95

US5399389AMar 21, 1995

Method for locally and globally planarizing chemical vapor deposition of SiO2 layers onto structured silicon substrates

SIEMENS AG31 citations90

US5874366AFeb 23, 1999

Method for etching a semiconductor substrate and etching system

SIEMENS AG15 citations71

INFINEON TECHNOLOGIES AG

2 patents

US6559005B2May 6, 2003

Method for fabricating capacitor electrodes

INFINEON TECHNOLOGIES AG10 citations73

US6566271B1May 20, 2003

Method of producing a semiconductor surface covered with fluorine

INFINEON TECHNOLOGIES AG2 citations54

ASM INC

1 patent

US6232196B1May 15, 2001

Method of depositing silicon with high step coverage

ASM INC138 citations93

AST ELECTRONIK GMBH

1 patent

US5727017AMar 10, 1998

Method and apparatus for determining emissivity of semiconductor material

AST ELECTRONIK GMBH77 citations93

R3T RAPID REACTIVE RADICALS TE

1 patent

US6706141B1Mar 16, 2004

Device to generate excited/ionized particles in a plasma

R3T RAPID REACTIVE RADICALS TE15 citations77

NIESS JUERGEN

1 patent

US9252011B2Feb 2, 2016

Method for forming a layer on a substrate at low temperatures

NIESS JUERGEN1 citations43

R3T GMBH RAPID REACTIVE RADICA

1 patent

US7665416B2Feb 23, 2010

Apparatus for generating excited and/or ionized particles in a plasma and a method for generating ionized particles

R3T GMBH RAPID REACTIVE RADICA0 citations38