Inventor
KOSUGI HITOSHI
JP18 patents
⚠️ This page may combine multiple inventors who share the name “KOSUGI HITOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
14 patentsUS6496245B2Dec 17, 2002
Developing method and developing apparatus
TOKYO ELECTRON LTD23 citations92
US6267516B1Jul 31, 2001
Developing apparatus and developing nozzle
TOKYO ELECTRON LTD35 citations92
US11309194B2Apr 19, 2022
Substrate liquid treatment apparatus
TOKYO ELECTRON LTD3 citations71
US11217451B2Jan 4, 2022
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD2 citations71
US11545367B2Jan 3, 2023
Substrate processing apparatus, substrate processing method, and chemical liquid
TOKYO ELECTRON LTD2 citations70
US8376637B2Feb 19, 2013
Photoresist coating and developing apparatus, substrate transfer method and interface apparatus
TOKYO ELECTRON LTD4 citations62
US7733472B2Jun 8, 2010
Method and system for determining condition of process performed for coating film before immersion light exposure
TOKYO ELECTRON LTD2 citations62
US12371796B2Jul 29, 2025
Substrate processing apparatus, substrate processing method, and chemical liquid
TOKYO ELECTRON LTD0 citations59
US7924396B2Apr 12, 2011
Coating/developing apparatus and pattern forming method
TOKYO ELECTRON LTD3 citations58
US12002687B2Jun 4, 2024
System and methods for wafer drying
TOKYO ELECTRON LTD0 citations56
US11515178B2Nov 29, 2022
System and methods for wafer drying
TOKYO ELECTRON LTD0 citations56
US7651285B2Jan 26, 2010
Edge exposure apparatus, coating and developing apparatus, edge exposure method and coating and developing method, and storage medium
TOKYO ELECTRON LTD1 citations51
US7431040B2Oct 7, 2008
Method and apparatus for dispensing a rinse solution on a substrate
TOKYO ELECTRON LTD1 citations51
US7826032B2Nov 2, 2010
Circulation system for high refractive index liquid in pattern forming apparatus
TOKYO ELECTRON LTD0 citations40