P

Inventor

SHINADA MASATO

JP17 patents
⚠️ This page may combine multiple inventors who share the name “SHINADA MASATO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

16 patents
US11823879B2Nov 21, 2023

Film formation apparatus and film formation method

TOKYO ELECTRON LTD3 citations72
US12522926B2Jan 13, 2026

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD0 citations61
US12463022B2Nov 4, 2025

Placing table and substrate processing apparatus

TOKYO ELECTRON LTD0 citations61
US12437976B2Oct 7, 2025

Substrate processing apparatus

TOKYO ELECTRON LTD0 citations61
US11542592B2Jan 3, 2023

Film forming system and method for forming film on substrate

TOKYO ELECTRON LTD1 citations61
US11742190B2Aug 29, 2023

Sputtering apparatus and film forming method

TOKYO ELECTRON LTD0 citations60
US11939665B2Mar 26, 2024

Film thickness measuring apparatus and film thickness measuring method, and film forming system and film forming method

TOKYO ELECTRON LTD1 citations59
US12002667B2Jun 4, 2024

Sputtering apparatus and method of controlling sputtering apparatus

TOKYO ELECTRON LTD0 citations51
US11495446B2Nov 8, 2022

Film formation device and film formation method

TOKYO ELECTRON LTD0 citations51
US12531219B2Jan 20, 2026

Substrate processing apparatus and cleaning method

TOKYO ELECTRON LTD0 citations50
US11851750B2Dec 26, 2023

Apparatus and method for performing sputtering process

TOKYO ELECTRON LTD0 citations50
US11664207B2May 30, 2023

Film-forming apparatus, film-forming system, and film-forming method

TOKYO ELECTRON LTD0 citations50
US11581171B2Feb 14, 2023

Cathode unit and film forming apparatus

TOKYO ELECTRON LTD0 citations50
US11512388B2Nov 29, 2022

Film forming apparatus and film forming method

TOKYO ELECTRON LTD0 citations50
US12315707B2May 27, 2025

Mounting table structure, substrate processing apparatus, and method of controlling substrate processing apparatus

TOKYO ELECTRON LTD0 citations48
US12261078B2Mar 25, 2025

Processing method and processing apparatus

TOKYO ELECTRON LTD0 citations48

CANON ANELVA CORP

1 patent