Inventor
TOSHIMA HIROYUKI
JP22 patents
⚠️ This page may combine multiple inventors who share the name “TOSHIMA HIROYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
17 patentsUS11551930B2Jan 10, 2023
Methods to reshape spacer profiles in self-aligned multiple patterning
TOKYO ELECTRON LTD1 citations62
US11469106B2Oct 11, 2022
Hard mask and hard mask forming method
TOKYO ELECTRON LTD0 citations62
US10189230B2Jan 29, 2019
Method for forming copper film
TOKYO ELECTRON LTD1 citations62
US8617363B2Dec 31, 2013
Magnetron sputtering apparatus
TOKYO ELECTRON LTD3 citations62
US11742190B2Aug 29, 2023
Sputtering apparatus and film forming method
TOKYO ELECTRON LTD0 citations60
US10068798B2Sep 4, 2018
Method and processing apparatus for performing pre-treatment to form copper wiring in recess formed in substrate
TOKYO ELECTRON LTD1 citations52
US9064690B2Jun 23, 2015
Method for forming Cu wiring
TOKYO ELECTRON LTD0 citations52
US11495446B2Nov 8, 2022
Film formation device and film formation method
TOKYO ELECTRON LTD0 citations51
US12027353B2Jul 2, 2024
Substrate processing method and apparatus
TOKYO ELECTRON LTD0 citations50
US12014911B2Jun 18, 2024
Sputtering apparatus
TOKYO ELECTRON LTD0 citations50
US11851750B2Dec 26, 2023
Apparatus and method for performing sputtering process
TOKYO ELECTRON LTD0 citations50
US11664207B2May 30, 2023
Film-forming apparatus, film-forming system, and film-forming method
TOKYO ELECTRON LTD0 citations50
US11512388B2Nov 29, 2022
Film forming apparatus and film forming method
TOKYO ELECTRON LTD0 citations50
US11479848B2Oct 25, 2022
Film forming apparatus and method
TOKYO ELECTRON LTD0 citations50
US11410837B2Aug 9, 2022
Film-forming device
TOKYO ELECTRON LTD0 citations50
US11158492B2Oct 26, 2021
Film forming apparatus and film forming method
TOKYO ELECTRON LTD0 citations50
US11705315B2Jul 18, 2023
Sputtering apparatus and sputtering method
TOKYO ELECTRON LTD0 citations49