Inventor
TAKAHASHI KAZUE
US59 patents
⚠️ This page may combine multiple inventors who share the name “TAKAHASHI KAZUE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
49 patentsUS6171438B1Jan 9, 2001
Plasma processing apparatus and plasma processing method
HITACHI LTD100 citations99
US6755932B2Jun 29, 2004
Plasma processing system and apparatus and a sample processing method
HITACHI LTD290 citations98
US6618692B2Sep 9, 2003
Remote diagnostic system and method for semiconductor manufacturing equipment
HITACHI LTD140 citations98
US6503364B1Jan 7, 2003
Plasma processing apparatus
HITACHI LTD92 citations97
US6815365B2Nov 9, 2004
Plasma etching apparatus and plasma etching method
HITACHI LTD44 citations96
US6048434AApr 11, 2000
Substrate holding system including an electrostatic chuck
HITACHI LTD68 citations96
US5906684AMay 25, 1999
Method of holding substrate and substrate holding system
HITACHI LTD54 citations96
US5895586AApr 20, 1999
Plasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminum
HITACHI LTD74 citations96
US5792304AAug 11, 1998
Method of holding substrate and substrate holding system
HITACHI LTD62 citations96
US5556204ASep 17, 1996
Method and apparatus for detecting the temperature of a sample
HITACHI LTD92 citations96
US5536359AJul 16, 1996
Semiconductor device manufacturing apparatus and method with optical monitoring of state of processing chamber
HITACHI LTD86 citations96
US6506686B2Jan 14, 2003
Plasma processing apparatus and plasma processing method
HITACHI LTD52 citations95
US5874012AFeb 23, 1999
Plasma processing apparatus and plasma processing method
HITACHI LTD60 citations95
US5442183AAug 15, 1995
Charged particle beam apparatus including means for maintaining a vacuum seal
HITACHI LTD47 citations95
US7376479B2May 20, 2008
Process monitoring device for sample processing apparatus and control method of sample processing apparatus
HITACHI LTD15 citations93
US7158848B2Jan 2, 2007
Process monitoring device for sample processing apparatus and control method of sample processing apparatus
HITACHI LTD19 citations93
US7058467B2Jun 6, 2006
Process monitoring device for sample processing apparatus and control method of sample processing apparatus
HITACHI LTD16 citations93
US6879867B2Apr 12, 2005
Process monitoring device for sample processing apparatus and control method of sample processing apparatus
HITACHI LTD25 citations93
US6759253B2Jul 6, 2004
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units
HITACHI LTD27 citations92
US6645871B2Nov 11, 2003
Method of holding substrate and substrate holding system
HITACHI LTD20 citations92
US6524428B2Feb 25, 2003
Method of holding substrate and substrate holding system
HITACHI LTD24 citations92
US6482747B1Nov 19, 2002
Plasma treatment method and plasma treatment apparatus
HITACHI LTD22 citations92
US6336991B1Jan 8, 2002
Method of holding substrate and substrate holding system
HITACHI LTD19 citations92
US6235146B1May 22, 2001
Vacuum treatment system and its stage
HITACHI LTD22 citations92
US6221201B1Apr 24, 2001
Method of holding substrate and substrate holding system
HITACHI LTD18 citations92
US5985035ANov 16, 1999
Method of holding substrate and substrate holding system
HITACHI LTD17 citations92
US5961774AOct 5, 1999
Method of holding substrate and substrate holding system
HITACHI LTD22 citations92
US5781400AJul 14, 1998
Electrostatically attracting electrode and a method of manufacture thereof
HITACHI LTD34 citations92
US5259735ANov 9, 1993
Evacuation system and method therefor
HITACHI LTD45 citations92
US5254856AOct 19, 1993
Charged particle beam apparatus having particular electrostatic objective lens and vacuum pump systems
HITACHI LTD43 citations92
US6217705B1Apr 17, 2001
Method of holding substrate and substrate holding system
HITACHI LTD26 citations91
US6186153B1Feb 13, 2001
Plasma treatment method and manufacturing method of semiconductor device
HITACHI LTD25 citations91
US6596551B1Jul 22, 2003
Etching end point judging method, etching end point judging device, and insulating film etching method using these methods
HITACHI LTD17 citations84
US5697751ADec 16, 1997
Wafer transfer apparatus and method
HITACHI LTD18 citations84
US6899789B2May 31, 2005
Method of holding substrate and substrate holding system
HITACHI LTD11 citations82
US6676805B2Jan 13, 2004
Method of holding substrate and substrate holding system
HITACHI LTD10 citations82
US7288166B2Oct 30, 2007
Plasma processing apparatus
HITACHI LTD6 citations74
US6967109B2Nov 22, 2005
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units
HITACHI LTD6 citations74
US6759338B2Jul 6, 2004
Plasma processing apparatus and method
HITACHI LTD9 citations74
US6649021B2Nov 18, 2003
Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield
HITACHI LTD9 citations74
US6610170B2Aug 26, 2003
Method of holding substrate and substrate holding system
HITACHI LTD8 citations74
US6610171B2Aug 26, 2003
Method of holding substrate and substrate holding system
HITACHI LTD6 citations74
US6544379B2Apr 8, 2003
Method of holding substrate and substrate holding system
HITACHI LTD9 citations74
US6537012B2Mar 25, 2003
Vacuum processing apparatus and a vacuum processing system
HITACHI LTD11 citations74
US7565879B2Jul 28, 2009
Plasma processing apparatus
HITACHI LTD6 citations73
US7208422B2Apr 24, 2007
Plasma processing method
HITACHI LTD4 citations73
US6923885B2Aug 2, 2005
Plasma processing system and apparatus and a sample processing method
HITACHI LTD11 citations73
US4511269AApr 16, 1985
Cancel type printing head
HITACHI LTD11 citations70
US7608162B2Oct 27, 2009
Plasma processing apparatus and method
HITACHI LTD4 citations63
MASSACHUSETTS GEN HOSPITAL
1 patentShowing the top 50 of 59 patents by PatentIndex Score.