Inventor
KIM HYEONG MOOK
KR3 patents
Patents
3 patentsUS12516220B2Jan 6, 2026
CMP slurry composition for polishing tungsten pattern wafer and method of polishing tungsten pattern wafer using the same
SAMSUNG SDI CO LTD0 citations46
US12139642B2Nov 12, 2024
CMP slurry composition for polishing tungsten pattern wafer and method of polishing tungsten pattern wafer using the same
SAMSUNG SDI CO LTD0 citations46
US11746258B2Sep 5, 2023
CMP slurry composition for copper films and method of polishing copper films using the same
SAMSUNG SDI CO LTD0 citations44