Inventor
NAKAMURA GENJI
JP21 patents
Patents
21 patentsUS10361366B2Jul 23, 2019
Resistive random accress memory containing a conformal titanium aluminum carbide film and method of making
TOKYO ELECTRON LTD324 citations96
US9893161B2Feb 13, 2018
Parasitic capacitance reduction structure for nanowire transistors and method of manufacturing
TOKYO ELECTRON LTD11 citations84
US9882026B2Jan 30, 2018
Method for forming a nanowire structure
TOKYO ELECTRON LTD7 citations84
US7622340B2Nov 24, 2009
Method for manufacturing semiconductor device
TOKYO ELECTRON LTD8 citations84
US7674710B2Mar 9, 2010
Method of integrating metal-containing films into semiconductor devices
TOKYO ELECTRON LTD10 citations83
US7446052B2Nov 4, 2008
Method for forming insulation film
TOKYO ELECTRON LTD10 citations82
US6821566B2Nov 23, 2004
Method and apparatus for forming insulating film containing silicon oxy-nitride
TOKYO ELECTRON LTD15 citations81
US8021987B2Sep 20, 2011
Method of modifying insulating film
TOKYO ELECTRON LTD3 citations62
US7892914B2Feb 22, 2011
Semiconductor device and manufacturing method thereof
TOKYO ELECTRON LTD4 citations62
US7662236B2Feb 16, 2010
Method for forming insulation film
TOKYO ELECTRON LTD3 citations62
US7655574B2Feb 2, 2010
Method of modifying insulating film
TOKYO ELECTRON LTD3 citations62
US7622402B2Nov 24, 2009
Method for forming underlying insulation film
TOKYO ELECTRON LTD2 citations62
US7084023B2Aug 1, 2006
Method of manufacturing semiconductor device, film-forming apparatus, and storage medium
TOKYO ELECTRON LTD5 citations61
US6933249B2Aug 23, 2005
Method of fabricating semiconductor device
TOKYO ELECTRON LTD3 citations61
US12351905B2Jul 8, 2025
Film forming method and film forming apparatus
TOKYO ELECTRON LTD0 citations60
US11869927B2Jan 9, 2024
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations60
US9698020B2Jul 4, 2017
CMOS Vt control integration by modification of metal-containing gate electrodes
TOKYO ELECTRON LTD0 citations52
US7897498B2Mar 1, 2011
Method for manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations51
US11737276B2Aug 22, 2023
Method of manufacturing semiconductor device and semiconductor device
TOKYO ELECTRON LTD0 citations46
US8846474B2Sep 30, 2014
Dual workfunction semiconductor devices and methods for forming thereof
TOKYO ELECTRON LTD0 citations41
US9887081B2Feb 6, 2018
Method for manufacturing insulating film laminated structure
TOKYO ELECTRON LTD0 citations37