Inventor
CUI LINYING
US26 patents
Patents
26 patentsUS11462389B2Oct 4, 2022
Pulsed-voltage hardware assembly for use in a plasma processing system
APPLIED MATERIALS INC12 citations93
US11948780B2Apr 2, 2024
Automatic electrostatic chuck bias compensation during plasma processing
APPLIED MATERIALS INC7 citations86
US11476145B2Oct 18, 2022
Automatic ESC bias compensation when using pulsed DC bias
APPLIED MATERIALS INC10 citations86
US10763081B2Sep 1, 2020
Apparatus and methods for manipulating radio frequency power at an edge ring in plasma process device
APPLIED MATERIALS INC13 citations86
US11776789B2Oct 3, 2023
Plasma processing assembly using pulsed-voltage and radio-frequency power
APPLIED MATERIALS INC6 citations85
US11462388B2Oct 4, 2022
Plasma processing assembly using pulsed-voltage and radio-frequency power
APPLIED MATERIALS INC6 citations85
US11232933B2Jan 25, 2022
Temperature and bias control of edge ring
APPLIED MATERIALS INC5 citations84
US10784089B2Sep 22, 2020
Temperature and bias control of edge ring
APPLIED MATERIALS INC7 citations84
US12148595B2Nov 19, 2024
Plasma uniformity control in pulsed DC plasma chamber
APPLIED MATERIALS INC4 citations75
US11901157B2Feb 13, 2024
Apparatus and methods for controlling ion energy distribution
APPLIED MATERIALS INC5 citations75
US11791138B2Oct 17, 2023
Automatic electrostatic chuck bias compensation during plasma processing
APPLIED MATERIALS INC4 citations75
US12237148B2Feb 25, 2025
Plasma processing assembly using pulsed-voltage and radio-frequency power
APPLIED MATERIALS INC2 citations74
US11984306B2May 14, 2024
Plasma chamber and chamber component cleaning methods
APPLIED MATERIALS INC2 citations73
US11798790B2Oct 24, 2023
Apparatus and methods for controlling ion energy distribution
APPLIED MATERIALS INC3 citations73
US11289310B2Mar 29, 2022
Circuits for edge ring control in shaped DC pulsed plasma process device
APPLIED MATERIALS INC2 citations73
US12255051B2Mar 18, 2025
Multi-shape voltage pulse trains for uniformity and etch profile tuning
APPLIED MATERIALS INC3 citations71
US12580162B2Mar 17, 2026
Temperature and bias control of edge ring
APPLIED MATERIALS INC0 citations62
US12525441B2Jan 13, 2026
Plasma chamber and chamber component cleaning methods
APPLIED MATERIALS INC0 citations62
US12394596B2Aug 19, 2025
Plasma uniformity control in pulsed DC plasma chamber
APPLIED MATERIALS INC0 citations62
US12334311B2Jun 17, 2025
Circuits for edge ring control in shaped dc pulsed plasma process device
APPLIED MATERIALS INC0 citations62
US12183557B2Dec 31, 2024
Apparatus and methods for controlling ion energy distribution
APPLIED MATERIALS INC1 citations62
US11908661B2Feb 20, 2024
Apparatus and methods for manipulating power at an edge ring in plasma process device
APPLIED MATERIALS INC0 citations62
US11810768B2Nov 7, 2023
Temperature and bias control of edge ring
APPLIED MATERIALS INC0 citations62
US11367593B2Jun 21, 2022
Apparatus and methods for manipulating radio frequency power at an edge ring in plasma process device
APPLIED MATERIALS INC0 citations62
US12525433B2Jan 13, 2026
Method and apparatus to reduce feature charging in plasma processing chamber
APPLIED MATERIALS INC0 citations52
US11276601B2Mar 15, 2022
Apparatus and methods for manipulating power at an edge ring in a plasma processing device
APPLIED MATERIALS INC0 citations52