Inventor · disambiguated record
Kwadwo E. Tettey
Also filed as: TETTEY KWADWO · TETTEY KWADWO E
6 granted patents·2 pending applications·7 citations·filing 2017–2022
70Inventor score
Top patents by PatentIndex Score
8 records- 0190US10626298B1Chemical mechanical polishing compositions and methods for suppressing the removal rate of amorphous siliconROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted Apr 21, 2020·5 cites·10 claims
- 0278US10787592B1Chemical mechanical polishing compositions and methods having enhanced defect inhibition and selectively polishing silicon nitride over silicon dioxide in an acid environmentROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted Sep 29, 2020·2 cites·8 claims
- 0358US2022356065A1Surface modified silanized colloidal silica particlesROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2022·Application pending·0 cites
- 0457US11772230B2Formulations for high porosity chemical mechanical polishing pads with high hardness and CMP pads made therewithROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2021·Granted Oct 3, 2023·0 cites·7 claims
- 0553US10954411B2Chemical mechanical polishing composition and method of polishing silicon nitride over silicon dioxide and simultaneously inhibiting damage to silicon dioxideROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted Mar 23, 2021·0 cites·8 claims
- 0653US10584265B2Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using themROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Mar 10, 2020·0 cites·5 claims
- 0749US2022348790A1Chemical mechanical polishing composition and methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2022·Application pending·0 cites
- 0844US10822524B2Aqueous compositions of low dishing silica particles for polysilicon polishingROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Nov 3, 2020·0 cites·10 claims
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