Inventor
CHENG MING-LUNG
TW24 patents
⚠️ This page may combine multiple inventors who share the name “CHENG MING-LUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
20 patentsUS9768277B2Sep 19, 2017
Method and apparatus of forming an integrated circuit with a strained channel region
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations84
US10522417B2Dec 31, 2019
FinFET device with different liners for PFET and NFET and method of fabricating thereof
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US12166071B2Dec 10, 2024
Dielectric fins with air gap and backside self-aligned contact
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11217679B2Jan 4, 2022
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US12191370B2Jan 7, 2025
Semiconductor device with tunable channel layer usage and methods of fabrication thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12154946B2Nov 26, 2024
Semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12142668B2Nov 12, 2024
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11810827B2Nov 7, 2023
FinFET device with different liners for PFET and NFET and method of fabricating thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11688767B2Jun 27, 2023
Semiconductor device structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11031299B2Jun 8, 2021
FinFET device with different liners for PFET and NFET and method of fabricating thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12527050B2Jan 13, 2026
Integrated circuit structure with source/drain spacers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12414331B2Sep 9, 2025
Isolation for multigate devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12324218B2Jun 3, 2025
Semiconductor devices with air gaps and the method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11837631B2Dec 5, 2023
Source/drain spacer with air gap in semiconductor devices and methods of fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11688768B2Jun 27, 2023
Integrated circuit structure with source/drain spacers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11600695B2Mar 7, 2023
Dielectric fins with air gap and backside self-aligned contact
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12396234B2Aug 19, 2025
Method for forming semiconductor device structure with a cap layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations56
US12389653B2Aug 12, 2025
Semiconductor devices and methods of fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12278276B2Apr 15, 2025
Multi-channel devices and method with anti-punch through process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US12446261B2Oct 14, 2025
Multi-gate devices and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations46