Inventor
IWAYANAGI TAKAO
JP13 patents
⚠️ This page may combine multiple inventors who share the name “IWAYANAGI TAKAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
12 patentsUS5554911ASep 10, 1996
Light-emitting elements
HITACHI LTD208 citations99
US6475680B1Nov 5, 2002
Lithium secondary battery, its electrolyte, and electric apparatus using the same
HITACHI LTD63 citations95
US5061599AOct 29, 1991
Radiation sensitive materials
HITACHI LTD26 citations92
US4436583AMar 13, 1984
Selective etching method of polyimide type resin film
HITACHI LTD32 citations92
US4536421AAug 20, 1985
Method of forming a microscopic pattern
HITACHI LTD37 citations89
US4835089AMay 30, 1989
Resist pattern forming process with dry etching
HITACHI LTD22 citations81
US4719161AJan 12, 1988
Mask for X-ray lithography and process for producing the same
HITACHI LTD7 citations74
US4985344AJan 15, 1991
Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer
HITACHI LTD14 citations73
US4465768AAug 14, 1984
Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate
HITACHI LTD15 citations73
US4469778ASep 4, 1984
Pattern formation method utilizing deep UV radiation and bisazide composition
HITACHI LTD13 citations72
US4614706ASep 30, 1986
Method of forming a microscopic pattern with far UV pattern exposure, alkaline solution development, and dry etching
HITACHI LTD16 citations71
US4983500AJan 8, 1991
Radiation imaging process for formation of contrast enhanced pattern using two photosensitive dialonium salt layers with removal of overlayer and developed resist pattern in underlayer
HITACHI LTD0 citations37