P

Inventor

REN HE

US65 patents
⚠️ This page may combine multiple inventors who share the name “REN HE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

45 patents
US9384997B2Jul 5, 2016

Dry-etch selectivity

APPLIED MATERIALS INC146 citations99
US8969212B2Mar 3, 2015

Dry-etch selectivity

APPLIED MATERIALS INC184 citations99
US9576810B2Feb 21, 2017

Process for etching metal using a combination of plasma and solid state sources

APPLIED MATERIALS INC40 citations94
US9761489B2Sep 12, 2017

Self-aligned interconnects formed using substractive techniques

APPLIED MATERIALS INC20 citations92
US10957533B2Mar 23, 2021

Methods for etching a structure for semiconductor applications

APPLIED MATERIALS INC15 citations86
US10636704B2Apr 28, 2020

Seam-healing method upon supra-atmospheric process in diffusion promoting ambient

APPLIED MATERIALS INC14 citations86
US10916433B2Feb 9, 2021

Methods of forming metal silicide layers and metal silicide layers formed therefrom

APPLIED MATERIALS INC14 citations85
US10049927B2Aug 14, 2018

Seam-healing method upon supra-atmospheric process in diffusion promoting ambient

APPLIED MATERIALS INC14 citations84
US9640424B2May 2, 2017

Integrated metal spacer and air gap interconnect

APPLIED MATERIALS INC6 citations84
US9269563B2Feb 23, 2016

Methods for forming interconnect structure utilizing selective protection process for hardmask removal process

APPLIED MATERIALS INC9 citations84
US9646876B2May 9, 2017

Aluminum nitride barrier layer

APPLIED MATERIALS INC9 citations83
US10256144B2Apr 9, 2019

Process integration approach of selective tungsten via fill

APPLIED MATERIALS INC5 citations82
US11410885B2Aug 9, 2022

Fully aligned subtractive processes and electronic devices therefrom

APPLIED MATERIALS INC2 citations73
US10692759B2Jun 23, 2020

Methods for manufacturing an interconnect structure for semiconductor devices

APPLIED MATERIALS INC2 citations73
US10643895B2May 5, 2020

Self-aligned interconnects formed using subtractive techniques

APPLIED MATERIALS INC5 citations73
US10008448B2Jun 26, 2018

Dielectric/metal barrier integration to prevent copper diffusion

APPLIED MATERIALS INC2 citations73
US9508561B2Nov 29, 2016

Methods for forming interconnection structures in an integrated cluster system for semicondcutor applications

APPLIED MATERIALS INC6 citations73
US9305831B2Apr 5, 2016

Integrated metal spacer and air gap interconnect

APPLIED MATERIALS INC4 citations73
US11164780B2Nov 2, 2021

Process integration approach for selective metal via fill

APPLIED MATERIALS INC3 citations72
US10727119B2Jul 28, 2020

Process integration approach of selective tungsten via fill

APPLIED MATERIALS INC2 citations72
US10388533B2Aug 20, 2019

Process integration method to tune resistivity of nickel silicide

APPLIED MATERIALS INC2 citations72
US10109520B2Oct 23, 2018

Methods for depositing dielectric barrier layers and aluminum containing etch stop layers

APPLIED MATERIALS INC2 citations72
US9601431B2Mar 21, 2017

Dielectric/metal barrier integration to prevent copper diffusion

APPLIED MATERIALS INC4 citations72
US9299605B2Mar 29, 2016

Methods for forming passivation protection for an interconnection structure

APPLIED MATERIALS INC3 citations72
US11967527B2Apr 23, 2024

Fully aligned subtractive processes and electronic devices therefrom

APPLIED MATERIALS INC0 citations63
US11205589B2Dec 21, 2021

Methods and apparatuses for forming interconnection structures

APPLIED MATERIALS INC0 citations63
US12543547B2Feb 3, 2026

Method of dielectric material fill and treatment

APPLIED MATERIALS INC0 citations62
US12046508B2Jul 23, 2024

Method of dielectric material fill and treatment

APPLIED MATERIALS INC0 citations62
US11955382B2Apr 9, 2024

Reverse selective etch stop layer

APPLIED MATERIALS INC0 citations62
US11908696B2Feb 20, 2024

Methods and devices for subtractive self-alignment

APPLIED MATERIALS INC0 citations62
US11615984B2Mar 28, 2023

Method of dielectric material fill and treatment

APPLIED MATERIALS INC0 citations62
US11289342B2Mar 29, 2022

Damage free metal conductor formation

APPLIED MATERIALS INC0 citations62
US11257677B2Feb 22, 2022

Methods and devices for subtractive self-alignment

APPLIED MATERIALS INC0 citations62
US10685849B1Jun 16, 2020

Damage free metal conductor formation

APPLIED MATERIALS INC1 citations62
US10438849B2Oct 8, 2019

Microwave anneal to improve CVD metal gap-fill and throughput

APPLIED MATERIALS INC1 citations62
US9299577B2Mar 29, 2016

Methods for etching a dielectric barrier layer in a dual damascene structure

APPLIED MATERIALS INC2 citations62
US11923244B2Mar 5, 2024

Subtractive metals and subtractive metal semiconductor structures

APPLIED MATERIALS INC0 citations61
US11830725B2Nov 28, 2023

Method of cleaning a structure and method of depositing a capping layer in a structure

APPLIED MATERIALS INC0 citations61
US11776806B2Oct 3, 2023

Multi-step pre-clean for selective metal gap fill

APPLIED MATERIALS INC0 citations61
US11515200B2Nov 29, 2022

Selective tungsten deposition within trench structures

APPLIED MATERIALS INC0 citations61
US11380536B2Jul 5, 2022

Multi-step pre-clean for selective metal gap fill

APPLIED MATERIALS INC1 citations61
US11094588B2Aug 17, 2021

Interconnection structure of selective deposition process

APPLIED MATERIALS INC0 citations61
US11355391B2Jun 7, 2022

Method for forming a metal gapfill

APPLIED MATERIALS INC0 citations60
US12002705B2Jun 4, 2024

Methods and apparatus for forming backside power rails

APPLIED MATERIALS INC0 citations56
US11749532B2Sep 5, 2023

Methods and apparatus for processing a substrate

APPLIED MATERIALS INC0 citations52

MICROMATERIALS LLC

5 patents

Showing the top 50 of 65 patents by PatentIndex Score.