P

Inventor

OGAWA JUN

JP131 patents
⚠️ This page may combine multiple inventors who share the name “OGAWA JUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

19 patents
US8357619B2Jan 22, 2013

Film formation method for forming silicon-containing insulating film

TOKYO ELECTRON LTD49 citations98
US7923378B2Apr 12, 2011

Film formation method and apparatus for forming silicon-containing insulating film

TOKYO ELECTRON LTD61 citations98
US7758920B2Jul 20, 2010

Method and apparatus for forming silicon-containing insulating film

TOKYO ELECTRON LTD81 citations98
US7462571B2Dec 9, 2008

Film formation method and apparatus for semiconductor process for forming a silicon nitride film

TOKYO ELECTRON LTD91 citations98
US7906168B2Mar 15, 2011

Film formation method and apparatus for forming silicon oxide film

TOKYO ELECTRON LTD50 citations94
US10176992B2Jan 8, 2019

Mask pattern forming method, fine pattern forming method, and film deposition apparatus

TOKYO ELECTRON LTD5 citations84
US7611995B2Nov 3, 2009

Method for removing silicon oxide film and processing apparatus

TOKYO ELECTRON LTD16 citations84
US8962495B2Feb 24, 2015

Film deposition method

TOKYO ELECTRON LTD9 citations81
US7795158B2Sep 14, 2010

Oxidation method and apparatus for semiconductor process

TOKYO ELECTRON LTD7 citations74
US11404271B2Aug 2, 2022

Film deposition apparatus for fine pattern forming

TOKYO ELECTRON LTD2 citations73
US10879066B2Dec 29, 2020

Mask pattern forming method, fine pattern forming method, and film deposition apparatus

TOKYO ELECTRON LTD2 citations73
US10151029B2Dec 11, 2018

Silicon nitride film forming method and silicon nitride film forming apparatus

TOKYO ELECTRON LTD4 citations72
US9552981B2Jan 24, 2017

Method and apparatus for forming metal oxide film

TOKYO ELECTRON LTD2 citations72
US10438791B2Oct 8, 2019

Film forming method, film forming apparatus, and storage medium

TOKYO ELECTRON LTD2 citations71
US12288671B2Apr 29, 2025

Film deposition apparatus for fine pattern forming

TOKYO ELECTRON LTD0 citations63
US11881379B2Jan 23, 2024

Film deposition apparatus for fine pattern forming

TOKYO ELECTRON LTD0 citations63
US11404272B2Aug 2, 2022

Film deposition apparatus for fine pattern forming

TOKYO ELECTRON LTD0 citations63
US12588440B2Mar 24, 2026

Substrate processing method and substrate processing apparatus for etching using oxidization

TOKYO ELECTRON LTD0 citations62
US11414753B2Aug 16, 2022

Processing method

TOKYO ELECTRON LTD0 citations62

FUJITSU LTD

6 patents

NEC VIEWTECHNOLOGY LTD

5 patents

HONDA MOTOR CO LTD

3 patents

YUKI GOSEI YAKUHIN KOGYO KK

3 patents

HASEBE KAZUHIDE

2 patents

OGAWA JUN

2 patents

SHOWA DENKO KK

1 patent

KATO HITOSHI

1 patent

UNIV NIIGATA

1 patent

SUNTORY LTD

1 patent

UNIV KYOTO

1 patent

NITTO KOGYO KK

1 patent

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

1 patent

DAICEL CORP

1 patent

API CORP

1 patent

FUJI PHOTO FILM CO LTD

1 patent

Showing the top 50 of 131 patents by PatentIndex Score.