Inventor
AKIYAMA SHOJI
JP137 patents
⚠️ This page may combine multiple inventors who share the name “AKIYAMA SHOJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU HANDOTAI KK
11 patentsUS6245647B1Jun 12, 2001
Method for fabrication of thin film
SHINETSU HANDOTAI KK287 citations99
US6680260B2Jan 20, 2004
Method of producing a bonded wafer and the bonded wafer
SHINETSU HANDOTAI KK53 citations96
US6544656B1Apr 8, 2003
Production method for silicon wafer and silicon wafer
SHINETSU HANDOTAI KK127 citations96
US6391796B1May 21, 2002
Method for heat-treating silicon wafer and silicon wafer
SHINETSU HANDOTAI KK61 citations96
US6573159B1Jun 3, 2003
Method for thermally annealing silicon wafer and silicon wafer
SHINETSU HANDOTAI KK29 citations92
US6413310B1Jul 2, 2002
Method for producing silicon single crystal wafer and silicon single crystal wafer
SHINETSU HANDOTAI KK45 citations92
US6461939B1Oct 8, 2002
SOI wafers and methods for producing SOI wafer
SHINETSU HANDOTAI KK42 citations91
US6245311B1Jun 12, 2001
Method for heat treatment of silicon wafer and silicon wafer
SHINETSU HANDOTAI KK38 citations90
US6645834B2Nov 11, 2003
Method for manufacturing annealed wafer and annealed wafer
SHINETSU HANDOTAI KK15 citations84
US6809015B2Oct 26, 2004
Method for heat treatment of silicon wafers and silicon wafer
SHINETSU HANDOTAI KK9 citations74
US6309458B1Oct 30, 2001
Method for fabricating silicon thin film
SHINETSU HANDOTAI KK8 citations74
SHINETSU CHEMICAL CO
11 patentsUS8030176B2Oct 4, 2011
Method for preparing substrate having monocrystalline film
SHINETSU CHEMICAL CO10 citations84
US7855127B2Dec 21, 2010
Method for manufacturing semiconductor substrate
SHINETSU CHEMICAL CO12 citations84
US7951513B2May 31, 2011
Pellicle and method for producing pellicle
SHINETSU CHEMICAL CO16 citations83
US7799589B2Sep 21, 2010
Optical waveguide apparatus and method for manufacturing the same
SHINETSU CHEMICAL CO8 citations82
US7901846B2Mar 8, 2011
Pellicle and method for manufacturing the same
SHINETSU CHEMICAL CO14 citations79
US10770648B2Sep 8, 2020
Method for producing composite wafer having oxide single-crystal film
SHINETSU CHEMICAL CO3 citations73
US10727396B2Jul 28, 2020
Method for producing composite wafer having oxide single-crystal film
SHINETSU CHEMICAL CO3 citations73
US10711373B2Jul 14, 2020
SiC composite substrate and method for manufacturing same
SHINETSU CHEMICAL CO2 citations73
US10629440B2Apr 21, 2020
Method for manufacturing composite wafer provided with oxide single crystal thin film
SHINETSU CHEMICAL CO3 citations73
US10612157B2Apr 7, 2020
Method for manufacturing SiC composite substrate, and method for manufacturing semiconductor substrate
SHINETSU CHEMICAL CO4 citations73
US9195130B2Nov 24, 2015
Pellicle for EUV
SHINETSU CHEMICAL CO6 citations73
ZEXEL CORP
6 patentsUS6467170B2Oct 22, 2002
Tube for heat exchangers and method of manufacturing same
ZEXEL CORP26 citations91
US6357520B1Mar 19, 2002
Heat exchanger
ZEXEL CORP30 citations91
US5979051ANov 9, 1999
Heat exchanger and method of producing the same
ZEXEL CORP22 citations91
US6799630B1Oct 5, 2004
Tube for heat exchangers and method of manufacturing the same
ZEXEL CORP17 citations82
US5908070AJun 1, 1999
Heat exchanger
ZEXEL CORP15 citations74
US5857367AJan 12, 1999
Brazing method
ZEXEL CORP8 citations74
SONY CORP
5 patentsUS10315194B2Jun 11, 2019
Chip device and a particle analyzing apparatus
SONY CORP20 citations94
US5695561ADec 9, 1997
Disk tray used with an apparatus for forming a protective film on an optical disk
SONY CORP10 citations74
USD960740SAug 16, 2022
Micro flow channel chip
SONY CORP2 citations73
USD907242SJan 5, 2021
Micro flow channel chip
SONY CORP3 citations73
USD795724SAug 29, 2017
Micro flow channel chip for a flow cytometer
SONY CORP2 citations73
AKIYAMA SHOJI
5 patentsUS8975159B2Mar 10, 2015
Method for manufacturing bonded wafer
AKIYAMA SHOJI14 citations84
US8748294B2Jun 10, 2014
SOS substrate with reduced stress
AKIYAMA SHOJI8 citations84
US8518612B2Aug 27, 2013
Pellicle for lithography and manufacturing method thereof
AKIYAMA SHOJI12 citations84
US8088670B2Jan 3, 2012
Method for manufacturing bonded substrate with sandblast treatment
AKIYAMA SHOJI9 citations84
US8546245B2Oct 1, 2013
Method for manufacturing composite substrate comprising wide bandgap semiconductor layer
AKIYAMA SHOJI5 citations73
MASSACHUSETTS INST TECHNOLOGY
4 patentsUS6621972B2Sep 16, 2003
Optical waveguides with trench structures
MASSACHUSETTS INST TECHNOLOGY53 citations94
US7321713B2Jan 22, 2008
Silicon based on-chip photonic band gap cladding waveguide
MASSACHUSETTS INST TECHNOLOGY45 citations91
US7190524B2Mar 13, 2007
Process for fabrication of high reflectors by reversal of layer sequence and application thereof
MASSACHUSETTS INST TECHNOLOGY26 citations90
US7310454B2Dec 18, 2007
Photonic bandgap modulator, amplifier, demux, and TDM devices
MASSACHUSETTS INST TECHNOLOGY13 citations84
ZEXEL VALEO CLIMATE CONTR CORP
2 patentsAKIYAMA YUJI
2 patentsSHIN ETSU HANDOTAL CO LTD
1 patentVALEO THERMAL SYS JAPAN CO
1 patentITO TATSUMI
1 patentSHINODA MASATAKA
1 patentShowing the top 50 of 137 patents by PatentIndex Score.