Inventor
PISARENCO MAXIM
NL25 patents
⚠️ This page may combine multiple inventors who share the name “PISARENCO MAXIM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
23 patentsUS10146140B2Dec 4, 2018
Methods and apparatus for simulating interaction of radiation with structures, metrology methods and apparatus, device manufacturing method
ASML NETHERLANDS BV8 citations83
US9939250B2Apr 10, 2018
Methods and apparatus for calculating electromagnetic scattering properties of a structure and for estimation of geometrical and material parameters thereof
ASML NETHERLANDS BV7 citations83
US10607334B2Mar 31, 2020
Method and apparatus for image analysis
ASML NETHERLANDS BV2 citations73
US10845304B2Nov 24, 2020
Scatterometer and method of scatterometry using acoustic radiation
ASML NETHERLANDS BV2 citations72
US10816904B2Oct 27, 2020
Method for determining contribution to a fingerprint
ASML NETHERLANDS BV2 citations70
US12332573B2Jun 17, 2025
Method for determining defectiveness of pattern based on after development image
ASML NETHERLANDS BV3 citations69
US12321101B2Jun 3, 2025
Method for applying a deposition model in a semiconductor manufacturing process
ASML NETHERLANDS BV2 citations68
US11041816B2Jun 22, 2021
Methods and apparatus for calculating electromagnetic scattering properties of a structure and for reconstruction of approximate structures
ASML NETHERLANDS BV2 citations67
US12271114B2Apr 8, 2025
Method and apparatus for predicting substrate image
ASML NETHERLANDS BV1 citations64
US12259659B2Mar 25, 2025
Aligning a distorted image
ASML NETHERLANDS BV1 citations64
US11536654B2Dec 27, 2022
Scatterometer and method of scatterometry using acoustic radiation
ASML NETHERLANDS BV0 citations62
US11347151B2May 31, 2022
Methods and apparatus for calculating electromagnetic scattering properties of a structure
ASML NETHERLANDS BV0 citations62
US11067901B2Jul 20, 2021
Method and apparatus for image analysis
ASML NETHERLANDS BV1 citations62
US10649345B2May 12, 2020
Methods and apparatuses for measurement of a parameter of a feature fabricated on a substrate
ASML NETHERLANDS BV1 citations62
US10444638B2Oct 15, 2019
Method for parameter determination and apparatus thereof
ASML NETHERLANDS BV1 citations62
US12586170B2Mar 24, 2026
System and method for generating predictive images for wafer inspection using machine learning
ASML NETHERLANDS BV1 citations61
US11429763B2Aug 30, 2022
Methods and apparatus for simulating interaction of radiation with structures, metrology methods and apparatus, device manufacturing method
ASML NETHERLANDS BV0 citations61
US10592618B2Mar 17, 2020
Methods and apparatus for simulating interaction of radiation with structures, metrology methods and apparatus, device manufacturing method
ASML NETHERLANDS BV1 citations61
US12493247B2Dec 9, 2025
Method and system for predicting process information with a parameterized model
ASML NETHERLANDS BV1 citations59
US11378891B2Jul 5, 2022
Method for determining contribution to a fingerprint
ASML NETHERLANDS BV1 citations59
US12204252B2Jan 21, 2025
Method for decision making in a semiconductor manufacturing process
ASML NETHERLANDS BV0 citations56
US11687007B2Jun 27, 2023
Method for decision making in a semiconductor manufacturing process
ASML NETHERLANDS BV1 citations56
US12567164B2Mar 3, 2026
Apparatus and method for determining three dimensional data based on an image of a patterned substrate
ASML NETHERLANDS BV0 citations46
PISARENCO MAXIM
2 patentsUS8875078B2Oct 28, 2014
Reference library generation method for methods of inspection, inspection apparatus and lithographic apparatus
PISARENCO MAXIM1 citations46
US10408753B2Sep 10, 2019
Method and apparatus for calculating electromagnetic scattering properties of finite periodic structures
PISARENCO MAXIM0 citations36