Inventor
HUNSCHE STEFAN
US47 patents
⚠️ This page may combine multiple inventors who share the name “HUNSCHE STEFAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
33 patentsUS8832610B2Sep 9, 2014
Method for process window optimized optical proximity correction
ASML NETHERLANDS BV27 citations92
US7749666B2Jul 6, 2010
System and method for measuring and analyzing lithographic parameters and determining optimal process corrections
ASML NETHERLANDS BV44 citations92
US10732513B2Aug 4, 2020
Method and apparatus for image analysis
ASML NETHERLANDS BV4 citations84
US10712672B2Jul 14, 2020
Method of predicting patterning defects caused by overlay error
ASML NETHERLANDS BV7 citations84
US10437157B2Oct 8, 2019
Method and apparatus for image analysis
ASML NETHERLANDS BV5 citations84
US9958791B2May 1, 2018
Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method
ASML NETHERLANDS BV8 citations84
US11079687B2Aug 3, 2021
Process window based on defect probability
ASML NETHERLANDS BV11 citations83
US11003093B2May 11, 2021
Process variability aware adaptive inspection and metrology
ASML NETHERLANDS BV5 citations82
US10514614B2Dec 24, 2019
Process variability aware adaptive inspection and metrology
ASML NETHERLANDS BV8 citations82
US10859926B2Dec 8, 2020
Methods for defect validation
ASML NETHERLANDS BV7 citations79
US9990451B2Jun 5, 2018
Process window optimizer
ASML NETHERLANDS BV10 citations77
US11681229B2Jun 20, 2023
Selection of measurement locations for patterning processes
ASML NETHERLANDS BV1 citations73
US11443083B2Sep 13, 2022
Identification of hot spots or defects by machine learning
ASML NETHERLANDS BV2 citations73
US11143970B2Oct 12, 2021
Method and apparatus for image analysis
ASML NETHERLANDS BV2 citations73
US10962886B2Mar 30, 2021
Selection of measurement locations for patterning processes
ASML NETHERLANDS BV1 citations73
US10761432B2Sep 1, 2020
Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method
ASML NETHERLANDS BV3 citations73
US10607334B2Mar 31, 2020
Method and apparatus for image analysis
ASML NETHERLANDS BV2 citations73
US10852646B2Dec 1, 2020
Displacement based overlay or alignment
ASML NETHERLANDS BV2 citations72
US11238189B2Feb 1, 2022
Process window optimizer
ASML NETHERLANDS BV3 citations71
US12271114B2Apr 8, 2025
Method and apparatus for predicting substrate image
ASML NETHERLANDS BV1 citations64
US12360461B2Jul 15, 2025
Identification of hot spots or defects by machine learning
ASML NETHERLANDS BV0 citations62
US12228862B2Feb 18, 2025
Selection of measurement locations for patterning processes
ASML NETHERLANDS BV0 citations62
US12189307B2Jan 7, 2025
Metrology data correction using image quality metric
ASML NETHERLANDS BV0 citations62
US11720029B2Aug 8, 2023
Method and apparatus for image analysis
ASML NETHERLANDS BV0 citations62
US11126093B2Sep 21, 2021
Focus and overlay improvement by modifying a patterning device
ASML NETHERLANDS BV0 citations62
US11022900B2Jun 1, 2021
Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method
ASML NETHERLANDS BV0 citations62
US12141507B2Nov 12, 2024
Process window optimizer
ASML NETHERLANDS BV0 citations61
US12092965B2Sep 17, 2024
Process variability aware adaptive inspection and metrology
ASML NETHERLANDS BV0 citations60
US11822255B2Nov 21, 2023
Process window based on defect probability
ASML NETHERLANDS BV0 citations60
US11669020B2Jun 6, 2023
Method and apparatus for pattern fidelity control
ASML NETHERLANDS BV0 citations59
US10908515B2Feb 2, 2021
Method and apparatus for pattern fidelity control
ASML NETHERLANDS BV1 citations59
US12386268B2Aug 12, 2025
Method for calibrating simulation process based on defect-based process window
ASML NETHERLANDS BV0 citations57
US10459345B2Oct 29, 2019
Focus-dose co-optimization based on overlapping process window
ASML NETHERLANDS BV0 citations34
BRION TECH INC
5 patentsUS7587704B2Sep 8, 2009
System and method for mask verification using an individual mask error model
BRION TECH INC483 citations99
US7694267B1Apr 6, 2010
Method for process window optimized optical proximity correction
BRION TECH INC86 citations98
US7488933B2Feb 10, 2009
Method for lithography model calibration
BRION TECH INC58 citations97
US7617477B2Nov 10, 2009
Method for selecting and optimizing exposure tool using an individual mask error model
BRION TECH INC47 citations96
US7564017B2Jul 21, 2009
System and method for characterizing aerial image quality in a lithography system
BRION TECH INC1 citations52
LUCENT TECHNOLOGIES INC
4 patentsUS6867852B2Mar 15, 2005
Method and apparatus for channel detection
LUCENT TECHNOLOGIES INC10 citations74
US6859306B2Feb 22, 2005
Method, apparatus and system for reducing gain ripple in a raman-amplified WDM system
LUCENT TECHNOLOGIES INC11 citations73
US6819480B2Nov 16, 2004
Method and apparatus for controlling the extinction ratio of transmitters
LUCENT TECHNOLOGIES INC7 citations68
US7099594B2Aug 29, 2006
Optical transmission using all-optical regeneration and dispersion techniques
LUCENT TECHNOLOGIES INC1 citations45