Inventor
KANEKO FUMITAKE
JP27 patents
⚠️ This page may combine multiple inventors who share the name “KANEKO FUMITAKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
20 patentsUS6811817B2Nov 2, 2004
Method for reducing pattern dimension in photoresist layer
TOKYO OHKA KOGYO CO LTD47 citations92
US6406829B1Jun 18, 2002
Negative-working photoresist composition
TOKYO OHKA KOGYO CO LTD44 citations92
US5700625ADec 23, 1997
Negative-working photoresist composition
TOKYO OHKA KOGYO CO LTD22 citations92
US6042988AMar 28, 2000
Chemical-amplification-type negative resist composition
TOKYO OHKA KOGYO CO LTD20 citations90
US7189499B2Mar 13, 2007
Method of forming fine patterns
TOKYO OHKA KOGYO CO LTD15 citations84
US7741260B2Jun 22, 2010
Rinsing fluid for lithography
TOKYO OHKA KOGYO CO LTD12 citations83
US5976760ANov 2, 1999
Chemical-sensitization resist composition
TOKYO OHKA KOGYO CO LTD16 citations82
US6245930B1Jun 12, 2001
Chemical-sensitization resist composition
TOKYO OHKA KOGYO CO LTD9 citations74
US6171749B1Jan 9, 2001
Negative-working chemical-amplification photoresist composition
TOKYO OHKA KOGYO CO LTD12 citations74
US6087068AJul 11, 2000
Undercoating composition for photolithographic resist
TOKYO OHKA KOGYO CO LTD13 citations74
US6083665AJul 4, 2000
Photoresist laminate and method for patterning using the same
TOKYO OHKA KOGYO CO LTD11 citations74
US5925495AJul 20, 1999
Photoresist laminate and method for patterning using the same
TOKYO OHKA KOGYO CO LTD15 citations74
US5789136AAug 4, 1998
Negative-working photoresist composition
TOKYO OHKA KOGYO CO LTD9 citations74
US7235345B2Jun 26, 2007
Agent for forming coating for narrowing patterns and method for forming fine pattern using the same
TOKYO OHKA KOGYO CO LTD9 citations73
US6455228B1Sep 24, 2002
Multilayered body for photolithographic patterning
TOKYO OHKA KOGYO CO LTD13 citations73
US7811748B2Oct 12, 2010
Resist pattern forming method and composite rinse agent
TOKYO OHKA KOGYO CO LTD2 citations62
US7553610B2Jun 30, 2009
Method of forming fine patterns
TOKYO OHKA KOGYO CO LTD6 citations62
US6544712B1Apr 8, 2003
Negative working resist composition
TOKYO OHKA KOGYO CO LTD5 citations62
US7033731B2Apr 25, 2006
Multilayered body for photolithographic patterning
TOKYO OHKA KOGYO CO LTD0 citations51
US6864036B2Mar 8, 2005
Negative-working photoresist composition
TOKYO OHKA KOGYO CO LTD1 citations51
SUGETA YOSHIKI
3 patentsUS8124318B2Feb 28, 2012
Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
SUGETA YOSHIKI2 citations60
US8187798B2May 29, 2012
Method of forming fine patterns
SUGETA YOSHIKI0 citations49
US8142980B2Mar 27, 2012
Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
SUGETA YOSHIKI0 citations48
HADA HIDEO
2 patentsUS9034556B2May 19, 2015
Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern
HADA HIDEO2 citations60
US9040220B2May 26, 2015
Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern
HADA HIDEO0 citations50