Inventor
TOMINAGA KOJI
JP21 patents
⚠️ This page may combine multiple inventors who share the name “TOMINAGA KOJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SANYO ELECTRIC CO
8 patentsUS7129183B2Oct 31, 2006
Method of forming grating microstrutures by anodic oxidation
SANYO ELECTRIC CO27 citations92
US6930053B2Aug 16, 2005
Method of forming grating microstructures by anodic oxidation
SANYO ELECTRIC CO15 citations92
US6734503B2May 11, 2004
Nitride-based semiconductor element
SANYO ELECTRIC CO16 citations84
US7113316B2Sep 26, 2006
Holographic optical element, position shift detecting apparatus, optical pickup apparatus, optical recording medium drive and method of fabricating holographic optical element
SANYO ELECTRIC CO2 citations62
US6967985B2Nov 22, 2005
Surface emission semiconductor laser device
SANYO ELECTRIC CO3 citations62
US6917454B2Jul 12, 2005
Holographic optical element, position shift detecting apparatus, optical pickup apparatus, optical recording medium drive and method of fabricating holographic optical element
SANYO ELECTRIC CO3 citations62
US6654397B2Nov 25, 2003
Semiconductor laser device and manufacturing method thereof
SANYO ELECTRIC CO2 citations62
US7348650B2Mar 25, 2008
Element having microstructure and manufacturing method thereof
SANYO ELECTRIC CO0 citations51
ROHM CO LTD
5 patentsUS7387686B2Jun 17, 2008
Film formation apparatus
ROHM CO LTD16 citations83
US7482234B2Jan 27, 2009
Method of fabricating a metal oxynitride thin film that includes a first annealing of a metal oxide film in a nitrogen-containing atmosphere to form a metal oxynitride film and a second annealing of the metal oxynitride film in an oxidizing atmosphere
ROHM CO LTD6 citations73
US7790627B2Sep 7, 2010
Semiconductor device, method of manufacturing the same, and method of manufacturing metal compound thin film
ROHM CO LTD3 citations62
US7772678B2Aug 10, 2010
Metallic compound thin film that contains high-k dielectric metal, nitrogen, and oxygen
ROHM CO LTD4 citations62
US7372112B2May 13, 2008
Semiconductor device, process for producing the same and process for producing metal compound thin film
ROHM CO LTD5 citations62
HORIBA LTD
5 patentsUS6425287B1Jul 30, 2002
Microflow sensor element and manufacturing method thereof
HORIBA LTD16 citations83
US7485189B2Feb 3, 2009
Thin film deposition device using an FTIR gas analyzer for mixed gas supply
HORIBA LTD12 citations82
US6875328B2Apr 5, 2005
pH sensor
HORIBA LTD7 citations73
US6320192B1Nov 20, 2001
Detector for use in infrared analyzer, flow detector and manufacturing method thereof
HORIBA LTD12 citations73
US7419920B2Sep 2, 2008
Metal thin film and semiconductor comprising a metal thin film
HORIBA LTD3 citations62