Inventor
DEMAYO YEHUDA
US2 patents
Patents
2 patentsUS6436820B1Aug 20, 2002
Method for the CVD deposition of a low residual halogen content multi-layered titanium nitride film having a combined thickness greater than 1000 Å
APPLIED MATERIALS INC31 citations90
US6548402B2Apr 15, 2003
Method of depositing a thick titanium nitride film
APPLIED MATERIALS INC16 citations82