Inventor
CHEN BEEN-DER
US18 patents
⚠️ This page may combine multiple inventors who share the name “CHEN BEEN-DER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
12 patentsUS8938699B2Jan 20, 2015
Multivariable solver for optical proximity correction
ASML NETHERLANDS BV6 citations83
US9619607B2Apr 11, 2017
Method and apparatus for cost function based simultaneous OPC and SBAR optimization
ASML NETHERLANDS BV7 citations82
US11232249B2Jan 25, 2022
Method for determining curvilinear patterns for patterning device
ASML NETHERLANDS BV5 citations73
US8448099B2May 21, 2013
Multivariable solver for optical proximity correction
ASML NETHERLANDS BV4 citations73
US8826198B2Sep 2, 2014
Method and apparatus for enhancing signal strength for improved generation and placement of model-based sub-resolution assist features (MB-SRAF)
ASML NETHERLANDS BV4 citations72
US11176307B2Nov 16, 2021
Method and system for pattern configuration
ASML NETHERLANDS BV4 citations71
US11734490B2Aug 22, 2023
Method for determining curvilinear patterns for patterning device
ASML NETHERLANDS BV0 citations62
US9418194B2Aug 16, 2016
Method and apparatus for model based flexible MRC
ASML NETHERLANDS BV2 citations59
US12430490B2Sep 30, 2025
Method for generating patterning device pattern at patch boundary
ASML NETHERLANDS BV0 citations57
US11797748B2Oct 24, 2023
Method for generating patterning device pattern at patch boundary
ASML NETHERLANDS BV1 citations57
US12554915B2Feb 17, 2026
Method for improving consistency in mask pattern generation
ASML NETHERLANDS BV0 citations50
US8806389B2Aug 12, 2014
Method and apparatus for model based flexible MRC
ASML NETHERLANDS BV1 citations48
WONG WILLIAM S
3 patentsUS8560979B2Oct 15, 2013
Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby
WONG WILLIAM S7 citations84
US8291352B2Oct 16, 2012
Multivariable solver for optical proximity correction
WONG WILLIAM S4 citations71
US8239786B2Aug 7, 2012
Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby
WONG WILLIAM S5 citations62